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Acetic Acid → 1-Methyl4-(4-prop-2-ynyl-phenyl)-piperazine

HRID 1163010
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HRID 1163010 반응식
C(O)(=O)C.FC(F)(F)C(O)=O.[BH4-].[Na+].[CH3:14][N:15]1[CH2:20][CH2:19][N:18]([C:21]2[CH:26]=[CH:25][C:24]([CH:27](O)[C:28]#[CH:29])=[CH:23][CH:22]=2)[CH2:17][CH2:16]1>C(Cl)Cl>[CH3:14][N:15]1[CH2:20][CH2:19][N:18]([C:21]2[CH:26]=[CH:25][C:24]([CH2:27][C:28]#[CH:29])=[CH:23][CH:22]=2)[CH2:17][CH2:16]1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

6

반응물 4

HCID 176Acetic AcidHCID 6422Trifluoroacetic acidHCID 4311764Sodium borohydrideHCID 577141411-[4-(4-Methyl-piperazin-1-yl)-phenyl]-prop-2-yn-1-ol

생성물 1

HCID 577141261-Methyl4-(4-prop-2-ynyl-phenyl)-piperazine수율 86.8%

시약·촉매·용매 1

HCID 6344
Dichloromethane
용매

실험 절차

To a stirred mixture of glacial acetic acid (72 ml) and trifluoroacetic acid (8 ml), NaBH4 (79.1 mmol) is added slowly under nitrogen at 15° C. The solution of 1-[4-(4-methyl-piperazin-1-yl)-phenyl]-prop-2-yn-1-ol (11.3 mmol) in CH2Cl2 (80 ml) is added dropwise over 0.5 h and the mixture is stirred at room temperature for 1 h. The solvents are removed under reduced pressure and the residue is added to saturated sodium bicarbonate. The aqueous solution is extracted with CH2Cl2. The organic layer is washed with brine, dried over magnesium sulfate and evaporated down. The crude product is applied to silica gel column chromatography, which is eluted with following solvents: CH2Cl2 and 5% MeOH in CH2Cl2. The solvent of the latter effluent is removed by evaporation and dried in vacuo to afford the title compound. yield 86.8%, Rf=0.52 (CH2Cl2:MeOH=9:1).

후처리

  1. additionis added slowly under nitrogen at 15° C
  2. customThe solvents are removed under reduced pressure
  3. additionthe residue is added to saturated sodium bicarbonate
  4. extractionThe aqueous solution is extracted with CH2Cl2
  5. washThe organic layer is washed with brine
  6. dry with materialdried over magnesium sulfate
  7. customevaporated down
  8. washis eluted with following solvents
  9. customThe solvent of the latter effluent is removed by evaporation
  10. customdried in vacuo

출처 및 근거

ORD 기록
ord-0b6bba1d49ef4d959df3d6fa507b0834
출처 데이터셋
uspto-grants-2010_10
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07820818B2

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