Trifluoromethane → Chf3 CF4

HRID 1182631

반응식

HRID 1182631 반응식
[CH:1]([F:4])([F:3])[F:2].[C:5]([F:9])([F:8])([F:7])[F:6]>>[CH:1]([F:4])([F:3])[F:2].[C:5]([F:9])([F:8])([F:7])[F:6]

참가 물질

3

실험 절차

SU8 membranes such as fabricated in Example 1 were inserted into the PlasmaLab 80 machine and treated for 1 to 10 minutes at a CHF3 flow of 20 sccm and an CF4 flow of 20 sccm. The background pressure was 25 mT and the plasma generator power was 300 W. The results of SEM morphology measurements, as well as water contact angle and AFM roughness analysis are shown in FIGS. 12a and 12b, respectively.

후처리

  1. customThe results of SEM morphology measurements

출처 및 근거

ORD 기록
ord-dd074aa4a37c4a6086acf39dc3df8ccf
출처 데이터셋
uspto-grants-2014_03
특허 번호
US08663780B2

연결된 노트

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