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Hydrochloric Acid → 3-(4-(2-(5-Amino-8-methylbenzo[f][1,7]naphthyridin-2-yl)ethyl)-3-methylphenoxy)propylphosphonic acid

HRID 1259232
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HRID 1259232 반응식
Cl.[NH2:2][C:3]1[C:12]2[N:11]=[CH:10][C:9]([CH2:13][CH2:14][C:15]3[CH:32]=[CH:31][C:18]([O:19][CH2:20][CH2:21][CH2:22][P:23](=[O:30])([O:27]CC)[O:24]CC)=[CH:17][C:16]=3[CH3:33])=[CH:8][C:7]=2[C:6]2[CH:34]=[CH:35][C:36]([CH3:38])=[CH:37][C:5]=2[N:4]=1>>[NH2:2][C:3]1[C:12]2[N:11]=[CH:10][C:9]([CH2:13][CH2:14][C:15]3[CH:32]=[CH:31][C:18]([O:19][CH2:20][CH2:21][CH2:22][P:23](=[O:24])([OH:27])[OH:30])=[CH:17][C:16]=3[CH3:33])=[CH:8][C:7]=2[C:6]2[CH:34]=[CH:35][C:36]([CH3:38])=[CH:37][C:5]=2[N:4]=1
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3

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HCID 313Hydrochloric AcidHCID 58213570Diethyl 3-(4-(2-(5-amino-8-methylbenzo[f][1,7]naphthyridin-2-yl)ethyl)-3-methylphenoxy)propylphosphonate

생성물 1

HCID 581665143-(4-(2-(5-Amino-8-methylbenzo[f][1,7]naphthyridin-2-yl)ethyl)-3-methylphenoxy)propylphosphonic acid

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온도
100 °C

실험 절차

A 12 N solution of hydrochloric acid (0.10 M) was added to diethyl 3-(4-(2-(5-amino-8-methylbenzo[f][1,7]naphthyridin-2-yl)ethyl)-3-methylphenoxy)propylphosphonate (from Example 149) and the resulting mixture was allowed to stir at 100° C. for 18 hours. At this point, hydrochloric acid was removed under reduced pressure and the resulting residue was purified by RP-HPLC using a 10-50% MeCN in water gradient. The resulting trifluoroacetate salt was then converted to the free base form by the addition of a saturated aqueous solution of sodium bicarbonate, followed by washing three times with ethyl acetate. The combined organic layers were dried with anhydrous Na2SO4, and the volatiles were removed in vacuo to deliver 3-(4-(2-(5-amino-8-methylbenzo[f][1,7]naphthyridin-2-yl)ethyl)-3-methylphenoxy)propylphosphonic acid as a solid. 1H NMR (Dimethylsulfoxide-d6): δ 9.72 (br, 1H), 9.01 (s, 1H), 8.96 (br, 1H), 8.85 (s, 1H), 8.54 (d, 1H), 7.54 (s, 1H), 7.42 (d, 1H), 7.08 (d, 1), 6.74 (s, 1H), 6.66 (d, 1H), 3.95 (t, 2H), 3.14 (t, 2H), 2.97 (t, 2H), 2.50 (s, 3H), 2.27 (s, 3H), 1.81-1.91 (m, 2H), 1.56-1.67 (m, 2H). LRMS [M+H]=466.2

후처리

  1. customAt this point, hydrochloric acid was removed under reduced pressure
  2. customthe resulting residue was purified by RP-HPLC
  3. additionThe resulting trifluoroacetate salt was then converted to the free base form by the addition of a saturated aqueous solution of sodium bicarbonate
  4. washby washing three times with ethyl acetate
  5. dry with materialThe combined organic layers were dried with anhydrous Na2SO4
  6. customthe volatiles were removed in vacuo

출처 및 근거

ORD 기록
ord-fa608aa328d6471fb1fc2195ffc3aa01
출처 데이터셋
uspto-grants-2013_06
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08466167B2

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