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Sulfuric Acid → 4-(3-Ethynylphenoxy)-1,2-dinitrobenzene

HRID 1283510
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HRID 1283510 반응식
[OH-].[Na+].[N+:3]([C:6]1[CH:7]=[C:8]([CH:21]=[CH:22][C:23]=1[N+:24]([O-:26])=[O:25])[O:9][C:10]1[CH:11]=[C:12]([CH:18]=[CH:19][CH:20]=1)[CH:13]=[C:14](Cl)C=O)([O-:5])=[O:4].S(=O)(=O)(O)O>O1CCOCC1>[C:13]([C:12]1[CH:11]=[C:10]([CH:20]=[CH:19][CH:18]=1)[O:9][C:8]1[CH:21]=[CH:22][C:23]([N+:24]([O-:26])=[O:25])=[C:6]([N+:3]([O-:5])=[O:4])[CH:7]=1)#[CH:14]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

5

반응물 3

HCID 1118Sulfuric AcidHCID 14798Sodium HydroxideHCID 537336452-Chloro-3-[3-(3,4-dinitrophenoxy)phenyl]prop-2-enal

생성물 1

HCID 203569524-(3-Ethynylphenoxy)-1,2-dinitrobenzene

시약·촉매·용매 1

HCID 312751,4-Dioxane용매

실험 절차

To 50 ml of refluxing 1N sodium hydroxide solution, under a nitrogen atmosphere, was added a solution containing 10 g (0.028 mole) of m-(3,4-dinitrophenoxy)-α-chlorocinnamaldehyde dissolved in 50 ml of 1,4-dioxane. The dark mixture was refluxed for one-half hour at which time the solution was cooled and acidified with 10% sulfuric acid. The reaction mixture was extracted with several 50 ml portions of ether, and the combined extracts evaporated to dryness. The residue was chromatographed on a 1 × 12 inch dry column of silica gel. Elution of the column using 3/1 hexane/methylene chloride produced a first band of sideproduct. Further elution using 1/1 hexane/methylene chloride yielded a second band which contained the desired product. Evaporation of the eluate to dryness in vacuo afforded 2 g (25%) of 4-(3-ethynylphenoxy)-o-dinitrobenzene as light yellow crystals, m.p. 68°-69°C.

후처리

  1. additionunder a nitrogen atmosphere, was added a solution
  2. temperatureThe dark mixture was refluxed for one-half hour at which time the solution
  3. temperaturewas cooled
  4. extractionThe reaction mixture was extracted with several 50 ml portions of ether
  5. customthe combined extracts evaporated to dryness
  6. customThe residue was chromatographed on a 1 × 12 inch
  7. customdry column of silica gel
  8. washElution of the column
  9. customproduced a first band of sideproduct
  10. washFurther elution
  11. customyielded a second band which

출처 및 근거

ORD 기록
ord-f2b379d8737a422e8a47cf34bc731c05
출처 데이터셋
uspto-grants-1976_08
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US03975444

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