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2,6-Lutidine → tert-butyl (3R)-6-cyclohexyl-3-(3-{[(isopropylsulfonyl)amino]methyl}-1,2,4-oxadiazol-5-yl)hexanoate

HRID 1350200
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HRID 1350200 반응식
[NH2:1][CH2:2][C:3]1[N:7]=[C:6]([C@H:8]([CH2:17][CH2:18][CH2:19][CH:20]2[CH2:25][CH2:24][CH2:23][CH2:22][CH2:21]2)[CH2:9][C:10]([O:12][C:13]([CH3:16])([CH3:15])[CH3:14])=[O:11])[O:5][N:4]=1.N1C(C)=CC=CC=1C.[CH:34]([S:37](Cl)(=[O:39])=[O:38])([CH3:36])[CH3:35]>C(Cl)Cl>[CH:20]1([CH2:19][CH2:18][CH2:17][C@@H:8]([C:6]2[O:5][N:4]=[C:3]([CH2:2][NH:1][S:37]([CH:34]([CH3:36])[CH3:35])(=[O:39])=[O:38])[N:7]=2)[CH2:9][C:10]([O:12][C:13]([CH3:15])([CH3:16])[CH3:14])=[O:11])[CH2:21][CH2:22][CH2:23][CH2:24][CH2:25]1
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참가 물질

5

반응물 3

HCID 79372,6-LutidineHCID 824082-Propanesulfonyl chlorideHCID 16747946tert-butyl(3R)-3-[3-(aminomethyl)-1,2,4-oxadiazol-5-yl]-6-cyclohexylhexanoate

생성물 1

HCID 16748329tert-butyl (3R)-6-cyclohexyl-3-(3-{[(isopropylsulfonyl)amino]methyl}-1,2,4-oxadiazol-5-yl)hexanoate수율 56.2%

시약·촉매·용매 1

HCID 6344Dichloromethane
용매
2회

실험 절차

A solution of tert-butyl(3R)-3-[3-(aminomethyl)-1,2,4-oxadiazol-5-yl]-6-cyclohexylhexanoate (preparation 18) (216 mg, 0.61 mmol) and 2,6-lutidine (180 μl, 1.50 mmol) in DCM (3 ml) was treated with isopropanesulphonylchloride (100 μl, 0.90 mmol) and stirred at room temperature for 18 hours. Reaction was complete but it was left for 12 days before purification commenced. The reaction mixture was diluted with DCM and washed with 1M HCl (2×20 ml), sat. NaHCO3 solution and brine. The organic extract was dried over anhydrous MgSO4, filtered and the solvent removed under reduced pressure. The residue was purified on a silica column eluting with a solvent gradient of pentane:EtOAc (90:10) gradually changing to (50:50) to afford the title compound as a colourless oil (157 mg, 56%).

후처리

  1. customReaction
  2. waitit was left for 12 days before purification
  3. washwashed with 1M HCl (2×20 ml), sat. NaHCO3 solution and brine
  4. extractionThe organic extract
  5. dry with materialwas dried over anhydrous MgSO4
  6. filtrationfiltered
  7. customthe solvent removed under reduced pressure
  8. customThe residue was purified on a silica column
  9. washeluting with a solvent gradient of pentane:EtOAc (90:10)

출처 및 근거

ORD 기록
ord-1bf1042a732546329c99c85c95e47c26
출처 데이터셋
uspto-grants-2007_05
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07214694B2

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