Vinyltriethoxysilane → Phosphonic acid, P-(2-(triethoxysilyl)ethyl)-, diethyl ester

HRID 13726

반응식

HRID 13726 반응식
[P:1]([O-:8])([O:5][CH2:6][CH3:7])[O:2][CH2:3][CH3:4].[CH:9]([Si:11]([O:18][CH2:19][CH3:20])([O:15][CH2:16][CH3:17])[O:12][CH2:13][CH3:14])=[CH2:10]>>[Si:11]([CH2:9][CH2:10][P:1]([O:5][CH2:6][CH3:7])([O:2][CH2:3][CH3:4])=[O:8])([O:18][CH2:19][CH3:20])([O:15][CH2:16][CH3:17])[O:12][CH2:13][CH3:14]

참가 물질

3

반응물 2

HCID 6516VinyltriethoxysilaneHCID 3780918Diethylphosphite

생성물 1

HCID 69792Phosphonic acid, P-(2-(triethoxysilyl)ethyl)-, diethyl ester수율 33%

실험 절차

Compounds of Formula II can be synthesised via a free radical promoted addition of a dialkyl phosphite to vinyl trialkoxy silane and then distillation, according to the procedure of G. H. Barnes and M. P. David in J. Org. Chem., 25, 1191, (1960). In this paper Barnes and David reported the synthesis of a number of organosilicon phosphonate esters and acids. They utilised known procedures for the free radical addition of dialkyl phosphites to double bonds. The state of this art is described in Org. Reactions. Vol. 13, 218-222. They reacted diethyl phosphite with vinyl triethoxy silane at 120-130° C. in the presence of a free radical initiator. The desired product, (EtO)3SiCH2CH2PO(OEt)2, was obtained after careful distillation in 33% yield.

후처리

  1. distillationdistillation
  2. customthe synthesis of a number of organosilicon phosphonate esters and acids

출처 및 근거

ORD 기록
ord-898f78d568204e16861cf6649281d05a
출처 데이터셋
uspto-grants-2010_06
특허 번호
US07728159B2

연결된 노트

불러오는 중…