반응식
[C:1]([C:4]1[C:5](=[O:31])[N:6]([CH3:30])[C:7]2[C:12]([C:13]=1[NH2:14])=[CH:11][C:10]([C:15]1[CH:20]=[CH:19][C:18]([Cl:21])=[CH:17][CH:16]=1)=[C:9]([C:22]1[CH:27]=[CH:26][C:25]([Cl:28])=[CH:24][C:23]=1[Cl:29])[N:8]=2)(=[O:3])[CH3:2].IC.[C:34]([O-])([O-])=O.[Cs+].[Cs+].C1C[O:43][CH2:42][CH2:41]1>>[C:1]([C:4]1[C:5](=[O:31])[N:6]([CH3:30])[C:7]2[C:12]([C:13]=1[N:14]([CH3:34])[C:42](=[O:43])[CH3:41])=[CH:11][C:10]([C:15]1[CH:16]=[CH:17][C:18]([Cl:21])=[CH:19][CH:20]=1)=[C:9]([C:22]1[CH:27]=[CH:26][C:25]([Cl:28])=[CH:24][C:23]=1[Cl:29])[N:8]=2)(=[O:3])[CH3:2]참가 물질
5
반응물 4
생성물 1
실험 절차
A solution of the product from Example 2 (60 mg) in THF (1 mL), under nitrogen, was treated with iodomethane (73 uL) and Cs2CO3 (58 mg). The suspension was stirred overnight. The reaction mixture was quenched with water and extracted with ethyl acetate. The organic layer was dried (MgSO4), filtered and concentrated in vacuo. Purification on a preparative silica TLC plate eluted with 25% EtOAc in hexane afforded the title compound. HPLC/MS: 528.1 (M+1), 530.1 (M+3); Rt=4.08 min.
후처리
- customThe reaction mixture was quenched with water
- extractionextracted with ethyl acetate
- dry with materialThe organic layer was dried (MgSO4)
- filtrationfiltered
- concentrationconcentrated in vacuo
- customPurification on a preparative silica TLC plate
- washeluted with 25% EtOAc in hexane
출처 및 근거
- ORD 기록
- ord-5eb9e7fa91e14297917b7a7df98dfbc3
- 출처 데이터셋
- uspto-grants-2010_06
- 특허 번호
- US07728141B2
연결된 노트
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