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Benzaldehyde → Styryl[4-(4-fluorophenyl)piperazino] sulfone

HRID 1392136
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HRID 1392136 반응식
[Li+].CC([N-]C(C)C)C.C([Li])CCC.C(NC(C)C)(C)C.[F:21][C:22]1[CH:27]=[CH:26][C:25]([N:28]2[CH2:33][CH2:32][N:31]([S:34]([CH3:37])(=[O:36])=[O:35])[CH2:30][CH2:29]2)=[CH:24][CH:23]=1.C(OP(Cl)(OCC)=O)C.[CH:47](=O)[C:48]1[CH:53]=[CH:52][CH:51]=[CH:50][CH:49]=1>C1COCC1>[F:21][C:22]1[CH:23]=[CH:24][C:25]([N:28]2[CH2:33][CH2:32][N:31]([S:34](/[CH:37]=[CH:47]/[C:48]3[CH:53]=[CH:52][CH:51]=[CH:50][CH:49]=3)(=[O:35])=[O:36])[CH2:30][CH2:29]2)=[CH:26][CH:27]=1
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참가 물질

8

반응물 6

HCID 240BenzaldehydeHCID 7912DiisopropylamineHCID 13139Diethyl chlorophosphateHCID 6690391-(4-Fluorophenyl)-4-(methylsulfonyl)piperazineHCID 2724682Lithium diisopropylamideHCID 178418339Butyllithium

생성물 1

HCID 882266
Styryl[4-(4-fluorophenyl)piperazino] sulfone
수율 46.3%

시약·촉매·용매 1

HCID 8028Tetrahydrofuran용매4회

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온도
-78 °C

실험 절차

To a solution of LDA [8.5 mmol; prepared by slow addition of n-butyl lithium (3.5 ml, 8.5 mmol, 2.5 M in hexane) to a solution of diisopropylamine (860 mg, 8.5 mmol) in dry THF (5 ml) at −78° C.] at −78° C. was added a solution of 1-(4-fluorophenyl)-4-(methanesulfonyl)piperazine (1 g, 3.87 mmol) in THF (25 ml) dropwise. The mixture was stirred at −78° C. for 1 hour and a solution of diethylchlorophosphate (670 mg; 3.87 mmol) in THF (3 ml) was added. The mixture was stirred at −78° C. for 1 hour and benzaldehyde (450 mg; 4.24 mmol) in THF (3 ml) was added. The mixture was gently warmed to room temperature and stirred for 18 hours. The mixture was washed with aqueous ammonium chloride and extracted with ethyl acetate. The organic layers were washed with water, brine and dried over MgSO4. Purification of the residue on silica (eluant: dichloromethane) afforded 1-(4-fluorophenyl)-4(trans-β-styrenesulfonyl)piperazine as a white powder (621 mg, 46%).

후처리

  1. stirringThe mixture was stirred at −78° C. for 1 hour
  2. temperatureThe mixture was gently warmed to room temperature
  3. stirringstirred for 18 hours
  4. washThe mixture was washed with aqueous ammonium chloride
  5. extractionextracted with ethyl acetate
  6. washThe organic layers were washed with water, brine
  7. dry with materialdried over MgSO4
  8. customPurification of the residue on silica (eluant: dichloromethane)

출처 및 근거

ORD 기록
ord-e6e31bef8b7d4fe4949106e08c65badc
출처 데이터셋
uspto-grants-2008_03
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07342020B2

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