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Sulfur Dioxide → 3-(2-Hydroxypropyl)thiophene-2-sulfonamide

HRID 1489821
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HRID 1489821 반응식
[OH:1][CH:2]([CH3:9])[CH2:3][C:4]1[CH:8]=[CH:7][S:6][CH:5]=1.C([Li])CCC.[S:15](=[O:17])=[O:16].C([O-])(=O)C.[Na+].[NH2:23]OS(O)(=O)=O.C(=O)(O)[O-].[Na+]>C1COCC1>[OH:1][CH:2]([CH3:9])[CH2:3][C:4]1[CH:8]=[CH:7][S:6][C:5]=1[S:15]([NH2:23])(=[O:17])=[O:16]
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참가 물질

8

반응물 6

HCID 1119Sulfur DioxideHCID 76284hydroxylamine-O-sulfonic acidHCID 516892Sodium BicarbonateHCID 517045Sodium AcetateHCID 229019111-(Thiophen-3-yl)propan-2-olHCID 178418339Butyllithium

생성물 1

HCID 22901969
3-(2-Hydroxypropyl)thiophene-2-sulfonamide
수율 42%

시약·촉매·용매 1

HCID 8028Tetrahydrofuran용매

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온도
-78 °C

실험 절차

To a solution of 3-(2-hydroxypropyl)thiophene (2.95 g, 20.77 mmol) i THF (25 mL) at -78° C. was added n-butyllithium (18.3 mL of a 2.5M solution, 45.69 mmol). This mixture was stirred at -78° C. for 1 hr and sulfur dioxide was added until the solution maintained a pH of 3. The reaction mixture was warmed to room temperature, stirred for 30 min, and evaporated to a residue which was dissolved in water (25 mL). Sodium acetate (5.1 g, 62.31 mmol) and hydroxylamine-O-sulfonic acid (7.0 g, 62.31 mmol) were added, the mixture stirred at room temperature for 18 hr, and the pH was adjusted to 8 with sodium bicarbonate. This solution was extracted with ethyl acetate (2×200 mL), the extracts were dried (MgSO4) and evaporated to a residue which was purified by column chromatography (silica, 50% hexane/ethyl acetate) to give 1.9 g (42%) of the desired product.

후처리

  1. temperaturemaintained a pH of 3
  2. temperatureThe reaction mixture was warmed to room temperature
  3. stirringstirred for 30 min
  4. customevaporated to a residue which
  5. dissolutionwas dissolved in water (25 mL)
  6. stirringthe mixture stirred at room temperature for 18 hr
  7. extractionThis solution was extracted with ethyl acetate (2×200 mL)
  8. dry with materialthe extracts were dried (MgSO4)
  9. customevaporated to a residue which
  10. customwas purified by column chromatography (silica, 50% hexane/ethyl acetate)

출처 및 근거

ORD 기록
ord-6e558ce9c7fa4c8fa411f225398b80e8
출처 데이터셋
uspto-grants-1997_10
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US05679670

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