Benzene → Hexadecylpyridinium Sulfathiazole

HRID 1517232

반응식

HRID 1517232 반응식
C1C=CC=CC=1.[Na+].[Cl-].[CH2:9]([N+:25]1[CH:30]=[CH:29][CH:28]=[CH:27][CH:26]=1)[CH2:10][CH2:11][CH2:12][CH2:13][CH2:14][CH2:15][CH2:16][CH2:17][CH2:18][CH2:19][CH2:20][CH2:21][CH2:22][CH2:23][CH3:24].[CH:31]1[C:36]([NH2:37])=[CH:35][CH:34]=[C:33]([S:38]([NH:41][C:42]2[S:46][CH:45]=[CH:44][N:43]=2)(=[O:40])=[O:39])[CH:32]=1>CS(C)=O>[CH2:9]([N+:25]1[CH:26]=[CH:27][CH:28]=[CH:29][CH:30]=1)[CH2:10][CH2:11][CH2:12][CH2:13][CH2:14][CH2:15][CH2:16][CH2:17][CH2:18][CH2:19][CH2:20][CH2:21][CH2:22][CH2:23][CH3:24].[CH:35]1[C:36]([NH2:37])=[CH:31][CH:32]=[C:33]([S:38]([NH:41][C:42]2[S:46][CH:45]=[CH:44][N:43]=2)(=[O:40])=[O:39])[CH:34]=1

참가 물질

6

반응물 4

HCID 241BenzeneHCID 2683CetylpyridiniumHCID 5234Sodium ChlorideHCID 5340Sulfathiazole

생성물 1

HCID 86612080Hexadecylpyridinium Sulfathiazole

시약·촉매·용매 1

HCID 679Dimethyl Sulfoxide용매

실험 절차

Hexadecylpyridinium chloride (0.003 mol) was dissolved in 100 mL of distilled water by gentle stirring and heating. Sulfathiazole sodium (0.003 mol) was dissolved in 60 mL of distilled water by gentle stirring and heating. The two solutions were combined and the reaction mixture was stirred at room temperature for 1 h. A rotary evaporator was used to remove the distilled water and produced the ionic liquid and NaCl salt. Benzene was used to dissolve the ionic liquid while the NaCl salt precipitated. The NaCl salt was filtered from the reaction solution. A rotary evaporator was used to remove the benzene and a yellow solid was obtained in a 77.22% yield. 1H NMR (DMSO) was obtained. Melting point (hot plate apparatus)=40-50° C. The hexadecylpyridinium ion is known to have antibacterial properties and the sulfathiazole is known for the treatment of gonorrhea and other bacterial infections.

후처리

  1. customprecipitated
  2. filtrationThe NaCl salt was filtered from the reaction solution
  3. customA rotary evaporator
  4. customto remove the benzene
  5. customa yellow solid was obtained in a 77.22% yield
  6. customMelting point (hot plate apparatus)=40-50° C

출처 및 근거

ORD 기록
ord-6a978b65b3174339addd3044030d6cf5
출처 데이터셋
uspto-grants-2012_07
특허 번호
US08232265B2

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