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Cesium carbonate → HCID 86673860, 화합물

HRID 1527447
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HRID 1527447 반응식
[F:1][C:2]1[C:7]([O:8][C:9]([F:12])([F:11])[F:10])=[CH:6][CH:5]=[CH:4][C:3]=1I.C([O-])([O-])=O.[Cs+].[Cs+].C1C=CC(P(C2C(C3C(P(C4C=CC=CC=4)C4C=CC=CC=4)=CC=C4C=3C=CC=C4)=C3C(C=CC=C3)=CC=2)C2C=CC=CC=2)=CC=1.[C:66](=[NH:79])([C:73]1[CH:78]=[CH:77][CH:76]=[CH:75][CH:74]=1)[C:67]1[CH:72]=[CH:71][CH:70]=[CH:69][CH:68]=1>C1(C)C=CC=CC=1.C1C=CC(/C=C/C(/C=C/C2C=CC=CC=2)=O)=CC=1.C1C=CC(/C=C/C(/C=C/C2C=CC=CC=2)=O)=CC=1.C1C=CC(/C=C/C(/C=C/C2C=CC=CC=2)=O)=CC=1.[Pd].[Pd]>[C:66](=[N:79][C:3]1[CH:4]=[CH:5][CH:6]=[C:7]([O:8][C:9]([F:12])([F:11])[F:10])[C:2]=1[F:1])([C:73]1[CH:74]=[CH:75][CH:76]=[CH:77][CH:78]=1)[C:67]1[CH:72]=[CH:71][CH:70]=[CH:69][CH:68]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

7

반응물 4

HCID 10796Cesium carbonateHCID 136809Benzophenone imineHCID 634876Binap, (A+-)-HCID 68283768HCID 68283768, 화합물

생성물 1

HCID 86673860HCID 86673860, 화합물

시약·촉매·용매 2

HCID 9811564Bis(dibenzylideneacetone)palladium
촉매
HCID 1140Toluene용매

실험 절차

To a solution of 2-fluoro-1-iodo-3-(trifluoromethoxy)benzene (25 g, 81 mmol) in dry toluene (200 mL) was added Cs2CO3 (38.7 g, 120 mmol), Pd2(dba)3 (7.42 g, 8.1 mmol), BINAP (10.8 g, 16.2 mmol) and benzhydrylideneamine (19.6 g, 108 mmol). The reaction mixture was refluxed for 8 h with stirring and then cooled to RT. The organic layer was washed with water and brine and then dried over MgSO4. After removal of solvent in vacuo, the residue was purified by column chromatography on silica gel (solvent gradient from 100% n-hexane to n-hexane/EtOAc 20:1) to afford the title compound as a pale yellow oil. 1H NMR (CDCl3, 400 MHz): δ 7.72 (s, 1H, ArH,), 7.70 (s, 1H, ArH), 7.45-7.42 (m, 1H, ArH,), 7.37-7.33 (m, 2H, ArH), 7.25-7.17 (m, 3H, ArH), 7.06 (s, 1H, ArH), 7.05 (s, 1H, ArH,), 6.84 (t, 1H, J=8 Hz, ArH), 6.78 (t, 1H, J=8 Hz, ArH), 6.67-6.64 (m, 1H, ArH).

후처리

  1. temperatureThe reaction mixture was refluxed for 8 h
  2. washThe organic layer was washed with water and brine
  3. dry with materialdried over MgSO4
  4. customAfter removal of solvent in vacuo
  5. customthe residue was purified by column chromatography on silica gel (solvent gradient from 100% n-hexane to n-hexane/EtOAc 20:1)

출처 및 근거

ORD 기록
ord-077fd326a9ff4b15a9b71788d62c25e9
출처 데이터셋
uspto-grants-2015_07
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US09085555B2

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