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Hydrochloric Acid → 5'-Ethoxyspiro(cyclohexane-1,2'-indan)-1',4-dione 4-ethylene ketal

HRID 1580274
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반응식

HRID 1580274 반응식
C1C2C(=CC=CC=2)CCC21CC[C:13](=[O:16])[CH2:12]C2.[CH2:17]([O:19][C:20]1[CH:21]=[C:22]2[C:26](=[CH:27][CH:28]=1)[C:25](=[O:29])[C:24]1([CH2:34][CH2:33][C:32](=[O:35])[CH2:31][CH2:30]1)[CH2:23]2)[CH3:18].Cl>CC(C)=O>[CH2:13]1[O:16][C:25]2([C:26]3[C:22](=[CH:21][C:20]([O:19][CH2:17][CH3:18])=[CH:28][CH:27]=3)[CH2:23][C:24]32[CH2:34][CH2:33][C:32](=[O:35])[CH2:31][CH2:30]3)[O:29][CH2:12]1
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참가 물질

5

반응물 3

HCID 313Hydrochloric AcidHCID 12251269HCID 12251269, 화합물HCID 541367305'-Ethoxyspiro(cyclohexane-1,2'-indan)1', 4-dione

생성물 1

HCID 867329365'-Ethoxyspiro(cyclohexane-1,2'-indan)-1',4-dione 4-ethylene ketal

시약·촉매·용매 1

HCID 180Acetone용매

실험 절차

A mixture of 1.86 g. (0.0072 mole) of 3',4'-dihydrospiro[cyclohexane-1,2'(1'H)-naphthalen]-4-one, ethylene ketal (8) (prepared in Example 7C) and 2 ml. of 2.5 N hydrochloric acid in 40 ml. of acetone is heated at reflux for about 17 hours. Most of the solvent is removed under vacuum and the residue dissolved in water and ether. The organic layer is washed with water and brine and then evaporated to dryness to give 3',4'-dihydrospiro[cyclohexane-1,2'(1'H)-naphthalen]-4-one (9).

후처리

  1. additionA mixture of 1.86 g
  2. temperatureat reflux for about 17 hours
  3. customMost of the solvent is removed under vacuum
  4. dissolutionthe residue dissolved in water
  5. washThe organic layer is washed with water and brine
  6. customevaporated to dryness

출처 및 근거

ORD 기록
ord-6c703c7e9bbb4b5c93c61ea6e078cf2c
출처 데이터셋
uspto-grants-1976_01
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US03932425

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