Hydrochloric Acid → 1-Benzoyl-3-[3-[4-benzyl-4-(propionylaminomethyl)piperid 1-yl]propyl]-3-(3,4-dichlorophenyl)piperidine hydrochloride

HRID 1597086노트

반응식

HRID 1597086 반응식
O.Cl.Cl.NCC1(CC2C=CC=CC=2)CCN(CCCC2(C3C=CC([Cl:35])=C(Cl)C=3)CCCN([C:21](=[O:28])[C:22]3C=CC=C[CH:23]=3)C2)CC1.[NH2:44][CH2:45][C:46]1([CH2:77][C:78]2[CH:83]=[CH:82][CH:81]=[CH:80][CH:79]=2)[CH2:51][CH2:50][N:49]([CH2:52][CH2:53][CH2:54][C:55]2([C:69]3[CH:74]=[CH:73][C:72]([Cl:75])=[C:71]([Cl:76])[CH:70]=3)[CH2:60][CH2:59][CH2:58][N:57]([C:61](=[O:68])[C:62]3[CH:67]=[CH:66][CH:65]=[CH:64][CH:63]=3)[CH2:56]2)[CH2:48][CH2:47]1.Cl.Cl.C(N(CC)CC)C.C(Cl)(=O)CC.Cl>C(Cl)Cl>[ClH:35].[C:61]([N:57]1[CH2:58][CH2:59][CH2:60][C:55]([CH2:54][CH2:53][CH2:52][N:49]2[CH2:50][CH2:51][C:46]([CH2:77][C:78]3[CH:79]=[CH:80][CH:81]=[CH:82][CH:83]=3)([CH2:45][NH:44][C:21](=[O:28])[CH2:22][CH3:23])[CH2:47][CH2:48]2)([C:69]2[CH:74]=[CH:73][C:72]([Cl:75])=[C:71]([Cl:76])[CH:70]=2)[CH2:56]1)(=[O:68])[C:62]1[CH:67]=[CH:66][CH:65]=[CH:64][CH:63]=1

참가 물질

6

반응물 4

HCID 313Hydrochloric AcidHCID 8471TriethylamineHCID 62324Propionyl chlorideHCID 1317216533-[3-[4-(Aminomethyl)-4-benzylpiperid-1-yl]propyl]-1-benzoyl-3-(3,4-dichlorophenyl)piperidine dihydrochloride hemihydrate

생성물 1

HCID 227418071-Benzoyl-3-[3-[4-benzyl-4-(propionylaminomethyl)piperid 1-yl]propyl]-3-(3,4-dichlorophenyl)piperidine hydrochloride수율 121.4%

시약·촉매·용매 1

HCID 6344Dichloromethane용매

실험 절차

A solution of 0.6 g of the compound obtained in EXAMPLE 9 and 0.18 ml of triethylamine in 10 ml of DCM is cooled to 0° C., 0.1 ml of propionyl chloride is added dropwise and the mixture is stirred for 5 minutes. It is concentrated under vacuum, the residue is extracted with AcOEt, the organic phase is washed twice with water and dried over MgSO4 and the solvent is evaporated off under vacuum. The residue is chromatographed on silica H using DCM and then a DCM/MeOH mixture (95/5; v/v) as the eluent. The product obtained is taken up with ethereal hydrogen chloride and the precipitate formed is filtered off to give 0.37 g of the expected product.

후처리

  1. concentrationIt is concentrated under vacuum
  2. extractionthe residue is extracted with AcOEt
  3. washthe organic phase is washed twice with water
  4. dry with materialdried over MgSO4
  5. customthe solvent is evaporated off under vacuum
  6. customThe residue is chromatographed on silica H
  7. customThe product obtained
  8. customthe precipitate formed
  9. filtrationis filtered off

출처 및 근거

ORD 기록
ord-f4598e6544a54495ad102cccb1bcab50
출처 데이터셋
uspto-grants-2001_09
특허 번호
US06291672B1

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