Hydrogen Peroxide → Odanacatib

HRID 1620929노트

반응식

HRID 1620929 반응식
[C:1]([C:3]1([NH:6][C:7](=[O:34])[C@H:8]([CH2:29][C:30]([F:33])([CH3:32])[CH3:31])[NH:9][C@@H:10]([C:15]2[CH:20]=[CH:19][C:18]([C:21]3[CH:26]=[CH:25][C:24](SC)=[CH:23][CH:22]=3)=[CH:17][CH:16]=2)[C:11]([F:14])([F:13])[F:12])[CH2:5][CH2:4]1)#[N:2].OO.[S:37]([O-:41])([O-])(=[O:39])=S.[Na+].[Na+].[C:44](OCC)(=O)C>C1(C)C=CC=CC=1.ClCCl>[C:1]([C:3]1([NH:6][C:7](=[O:34])[C@H:8]([CH2:29][C:30]([F:33])([CH3:31])[CH3:32])[NH:9][C@@H:10]([C:15]2[CH:16]=[CH:17][C:18]([C:21]3[CH:22]=[CH:23][C:24]([S:37]([CH3:44])(=[O:41])=[O:39])=[CH:25][CH:26]=3)=[CH:19][CH:20]=2)[C:11]([F:12])([F:13])[F:14])[CH2:4][CH2:5]1)#[N:2]

참가 물질

7

반응물 4

HCID 784Hydrogen PeroxideHCID 8857Ethyl AcetateHCID 24477Sodium ThiosulfateHCID 11496895HCID 11496895, 화합물

생성물 1

HCID 10152654Odanacatib

시약·촉매·용매 2

HCID 1140Toluene용매HCID 6344Dichloromethane용매

실험 절차

To a 0° solution of the sulfide (0.265 g) from Step 10 in toluene (5 mL) and dichloromethane (5 mL) was added Na2WO4.2H2O (0.002 g) and n-Bu4 NHSO4 (0.01 g). 30% Hydrogen peroxide (0.137 mL) was then slowly added and the mixture was stirred at room temperature for 3 hours. The mixture was poured slowly onto a mixture of ice, dilute aqueous sodium thiosulfate and ethyl acetate. The organic layer was separated and the aqueous further extracted with ethyl acetate. The combined organic layers were washed with brine, dried with magnesium sulfate and the solvent was removed in vacuo to yield a residue which was purified on SiO2 using ethyl acetate, hexanes and dichloromethane (1:1:0.1) as eluant. The residue was triturated in diethyl ether to yield N1-(1-cyanocyclopropyl)-4-fluoro-N2-{(1S)-2,2,2-trifluoro-1-[4′-(methylsulfonyl)-1,1′-biphenyl-4-yl]ethyl}-L-leucinamide.

후처리

  1. customThe organic layer was separated
  2. extractionthe aqueous further extracted with ethyl acetate
  3. washThe combined organic layers were washed with brine
  4. dry with materialdried with magnesium sulfate
  5. customthe solvent was removed in vacuo
  6. customto yield a residue which
  7. customwas purified on SiO2
  8. customThe residue was triturated in diethyl ether

출처 및 근거

ORD 기록
ord-7fa021887d1e4f1c87c4f570a1c04708
출처 데이터셋
uspto-grants-2014_07
특허 번호
US08772336B2

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