홈MCP워크벤치Skills
홈워크벤치알림마이페이지
llms.txt · MCP 가이드개인정보처리방침 · 이용약관 · 지원v1.8.0
  1. 홈
  2. /반응

Ethanolamine → 3-{2-ethyl-4-[5-(4-isobutyl-5-methyl-thiophen-2-yl)-[1,2,4]oxadiazol-3-yl]-6-methyl-phenyl}-N-(2-hydroxy-ethyl)-propionamide

HRID 1676151
노트
인쇄 미리보기

반응식

HRID 1676151 반응식
[CH2:1]([C:3]1[CH:8]=[C:7]([C:9]2[N:13]=[C:12]([C:14]3[S:15][C:16]([CH3:23])=[C:17]([CH2:19][CH:20]([CH3:22])[CH3:21])[CH:18]=3)[O:11][N:10]=2)[CH:6]=[C:5]([CH3:24])[C:4]=1[CH2:25][CH2:26][C:27](O)=[O:28])[CH3:2].CCN(C(C)C)C(C)C.CN(C(ON1N=NC2C=CC=CC1=2)=[N+](C)C)C.[B-](F)(F)(F)F.[CH2:61]([CH2:63][NH2:64])[OH:62]>C(Cl)Cl.CC(=O)OCC>[CH2:1]([C:3]1[CH:8]=[C:7]([C:9]2[N:13]=[C:12]([C:14]3[S:15][C:16]([CH3:23])=[C:17]([CH2:19][CH:20]([CH3:22])[CH3:21])[CH:18]=3)[O:11][N:10]=2)[CH:6]=[C:5]([CH3:24])[C:4]=1[CH2:25][CH2:26][C:27]([NH:64][CH2:63][CH2:61][OH:62])=[O:28])[CH3:2]
참가 물질반응 조건실험 절차후처리출처 및 근거반응 노트

참가 물질

7

반응물 4

HCID 700EthanolamineHCID 81531DiisopropylethylamineHCID 2733207O-(Benzotriazol-1-yl)-N,N,N',N'-tetramethyluronium tetrafluoroborateHCID 594978783-{2-Ethyl-4-[5-(4-isobutyl-5-methyl-thiophen-2-yl)-[1,2,4]oxadiazol-3-yl]-6-methyl-phenyl}-propionic acid

생성물 1

HCID 237292783-{2-ethyl-4-[5-(4-isobutyl-5-methyl-thiophen-2-yl)-[1,2,4]oxadiazol-3-yl]-6-methyl-phenyl}-N-(2-hydroxy-ethyl)-propionamide
수율 85.6%

시약·촉매·용매 2

HCID 6344Dichloromethane용매HCID 8857Ethyl Acetate용매

반응 조건

온도
0 °C

실험 절차

To a solution of 3-{2-ethyl-4-[5-(4-isobutyl-5-methyl-thiophen-2-yl)-[1,2,4]oxadiazol-3-yl]-6-methyl-phenyl}-propionic acid (42 mg, 100 μmol) and DIPEA (39 mg, 300 μmol) in DCM (2 mL), TBTU (32 mg, 100 μmol) followed by ethanolamine (18 mg, 300 μmol) is added. The mixture is stirred at 0° C. for 16 h before it is diluted with EA, washed with 1 N aq. NaOH solution, dried over Na2SO4 and filtered. The solvent is evaporated and the residue is dried under HV to give 3-{2-ethyl-4-[5-(4-isobutyl-5-methyl-thiophen-2-yl)-[1,2,4]oxadiazol-3-yl]-6-methyl-phenyl}-N-(2-hydroxy-ethyl)-propionamide (39 mg) as a beige solid; LC-MS: tR=1.10 min, [M+1]=456.47.

후처리

  1. additionis added
  2. washwashed with 1 N aq. NaOH solution
  3. dry with materialdried over Na2SO4
  4. filtrationfiltered
  5. customThe solvent is evaporated
  6. customthe residue is dried under HV

출처 및 근거

ORD 기록
ord-d6f46716531f4c7d8c4d004d6488cc49
출처 데이터셋
uspto-grants-2011_08
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08003800B2

반응 노트

불러오는 중…

이 페이지에서참가 물질반응 조건실험 절차후처리출처 및 근거반응 노트