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Diethyl Ether → HCID 13706071, 화합물

HRID 1730944
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HRID 1730944 반응식
[CH3:1][NH:2][C:3]([CH2:5][CH2:6][N:7]1[C:15]2[C:10](=[CH:11][CH:12]=[CH:13][CH:14]=2)[C:9]([C:16]2[CH:21]=[CH:20][CH:19]=[CH:18][CH:17]=2)=[N:8]1)=O.[H-].[Al+3].[Li+].[H-].[H-].[H-].CCOCC.[OH-].[Na+]>O1CCCC1>[CH3:1][NH:2][CH2:3][CH2:5][CH2:6][N:7]1[C:15]2[C:10](=[CH:11][CH:12]=[CH:13][CH:14]=2)[C:9]([C:16]2[CH:21]=[CH:20][CH:19]=[CH:18][CH:17]=2)=[N:8]1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

6

반응물 4

HCID 3283Diethyl EtherHCID 14798Sodium HydroxideHCID 13706068N-Methyl-3-(3-phenyl-1H-indazol-1-yl)propanamideHCID 21226445Aluminium lithium hydride

생성물 1

HCID 13706071HCID 13706071, 화합물수율 2.5%

시약·촉매·용매 1

HCID 8028Tetrahydrofuran
용매

실험 절차

1-N-Monomethylcarbamoylethyl-3-phenylindazole (m.p. 111°-112° C) (50 g) was dissolved in anhydrous tetrahydrofuran (40 ml) and to the solution was added lithium aluminum hydride (1.5 g) under cooling with ice followed by heating under reflux for 20 min. while stirring. Aqueous ether and aqueous sodium hydroxide solution were added to the resulting reaction mixture to separate an organic layer. 10% Hydrochloric acid was added to the organic layer to separate water layer. The water layer was alkalized with the addition of an aqueous sodium hydroxide solution, extracted with benzene, and the extract was washed with water, dried over sodium sulfate and concentrated under reduced pressure to obtain 1.2 g of 1-N-monomethylaminopropyl-3-phenylindazole as an oily product. The product was converted to its oxalate by a conventional way and then recrystallized from methanol to obtain crystals having a melting point between 197°-198° C (decomposition).

후처리

  1. temperatureunder cooling with ice
  2. temperatureby heating
  3. temperatureunder reflux for 20 min.
  4. customto separate an organic layer
  5. addition10% Hydrochloric acid was added to the organic layer
  6. customto separate water layer
  7. additionThe water layer was alkalized with the addition of an aqueous sodium hydroxide solution
  8. extractionextracted with benzene
  9. washthe extract was washed with water
  10. dry with materialdried over sodium sulfate
  11. concentrationconcentrated under reduced pressure

출처 및 근거

ORD 기록
ord-b748857f66204775883ea3231cf12735
출처 데이터셋
uspto-grants-1976_11
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US03994890

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