Indium oxide → Indium oxide samarium oxide

HRID 1771006

반응식

HRID 1771006 반응식
[O-2:1].[In+3:2].[O-2].[O-2].[In+3].[O-2].[Sm+3:7].[O-2].[O-2].[Sm+3]>>[O-2:1].[In+3:2].[O-2:1].[O-2:1].[In+3:2].[O-2:1].[Sm+3:7].[O-2:1].[O-2:1].[Sm+3:7]

참가 물질

3

실험 절차

Except that a spattering target containing indium oxide and samarium oxide (molar ratio of In:Sm=90:10) was used, indium oxide-samarium oxide (ISmO) thin films were formed in the same manner as in Example 1-1 and Comparative 1-1. [Evaluation of ISmO thin films of Example 1-9 and Comparative 1-9]

출처 및 근거

ORD 기록
ord-97421e3459194d7186a29194cf399963
출처 데이터셋
uspto-grants-2016_02
특허 번호
US09249032B2

연결된 노트

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