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Huagongshe화공사 화학 정보 인쇄 보고서 · 연구 참고용
HRID 1771006생성일: 2026년 10월 27일

Indium oxide → Indium oxide samarium oxide

https://huagongshe.com/reaction/1771006

반응식

참여 물질

역할이름HCID투입량
반응물Indium oxideHCID 150905—
반응물Samarium oxide (Sm2O3)HCID 159425—
생성물Indium oxide samarium oxideHCID 131731697—

반응 단계

Except that a spattering target containing indium oxide and samarium oxide (molar ratio of In:Sm=90:10) was used, indium oxide-samarium oxide (ISmO) thin films were formed in the same manner as in Example 1-1 and Comparative 1-1. [Evaluation of ISmO thin films of Example 1-9 and Comparative 1-9]

출처 및 근거

DOI10.6084/m9.figshare.5104873.v1
특허 번호US09249032B2
출처 데이터셋uspto-grants-2016_02
ORD IDord-97421e3459194d7186a29194cf399963
출처 메모uspto-grants-2016_02