huagongshe.com
HRID1771006

反应详情

EQUATION

反应方程式

HRID 1771006 的结构方程式

REACTANTS

反应物

2
结构：[In+3].[In+3].[O-2].[O-2].[O-2]
HCID150905

Indium(3+) oxide

In2O3

结构：[O-2].[O-2].[O-2].[Sm+3].[Sm+3]
HCID159425

Samarium(3+) oxide (2/3)

O3Sm2

PRODUCTS

生成物

1
结构：[In+3].[In+3].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[Sm+3].[Sm+3]
HCID131731697

未命名化合物

PROCEDURE

实验过程

Except that a spattering target containing indium oxide and samarium oxide (molar ratio of In:Sm=90:10) was used, indium oxide-samarium oxide (ISmO) thin films were formed in the same manner as in Example 1-1 and Comparative 1-1. [Evaluation of ISmO thin films of Example 1-9 and Comparative 1-9]