Hydrochloric Acid → HCID 178513764, 화합물

HRID 1852479노트

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HRID 1852479 반응식
[C:1]1([NH:7][C:8]2[C:12]([C:13]#[N:14])=[CH:11][N:10](COCC[Si](C)(C)C)[N:9]=2)[CH:6]=[CH:5][CH:4]=[CH:3][CH:2]=1.C1(NC2N(C[O:36]CC[Si](C)(C)C)N=CC=2C#N)C=CC=CC=1.Cl.C([O-])([O-])=O.[Na+].[Na+]>CCO.O>[C:1]1([NH:7][C:8]2[C:12]([C:13]([NH2:14])=[O:36])=[CH:11][NH:10][N:9]=2)[CH:6]=[CH:5][CH:4]=[CH:3][CH:2]=1

참가 물질

7

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온도
0 °C

실험 절차

To a solution containing a mixture of 3-(phenylamino)-1-{[2-(trimethylsilyl)ethoxy]methyl}-1H-pyrazole-4-carbonitrile and 5-(phenylamino)-1-{[2-(trimethylsilyl)ethoxy]methyl}-1H-pyrazole-4-carbonitrile (2.6 g, 7.8 mmol) in EtOH (40.3 mL) was added 2N aqueous HCl (40.3 mL). The resulting mixture was heated at 0° C. for 1 hour. The mixture was cooled to ambient temperature and carefully neutralized with 3N aqueous Na2CO3 until pH ˜9. The solution was further diluted with H2O (400 mL), the layers were partitioned and the aqueous mixture was extracted with EtOAc (2×). The combined organic layers were washed with brine, dried over anhydrous Na2SO4, filtered, and concentrated in vacuo. The crude residue was adsorbed on silica gel in vacuo and purified by MPLC on silica gel (using a gradient elution of 0-100% EtOAc/DCM) to afford the title compound, which was used without further purification.

후처리

  1. additionTo a solution containing
  2. temperatureThe mixture was cooled to ambient temperature
  3. customthe layers were partitioned
  4. extractionthe aqueous mixture was extracted with EtOAc (2×)
  5. washThe combined organic layers were washed with brine
  6. dry with materialdried over anhydrous Na2SO4
  7. filtrationfiltered
  8. concentrationconcentrated in vacuo
  9. custompurified by MPLC on silica gel (
  10. washa gradient elution of 0-100% EtOAc/DCM)

출처 및 근거

ORD 기록
ord-c992f5552cbd41a0921362693dd21240
출처 데이터셋
uspto-grants-2015_02
특허 번호
US08962608B2

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