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Trimethyl phosphonoacetate → HCID 69858985, 화합물

HRID 1860294
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HRID 1860294 반응식
[CH3:1][O:2][C:3]([CH2:5]P(OC)(OC)=O)=[O:4].C[Si]([N-][Si](C)(C)C)(C)C.[Na+].[CH:22]([C:24]1[CH:29]=[CH:28][C:27](/[C:30](/[C:40]2[CH:45]=[CH:44][C:43]([F:46])=[CH:42][CH:41]=2)=[C:31](\[C:34]2[CH:39]=[CH:38][CH:37]=[CH:36][CH:35]=2)/[CH2:32][CH3:33])=[CH:26][CH:25]=1)=O>C1COCC1.[Cl-].[Na+].O>[F:46][C:43]1[CH:42]=[CH:41][C:40]([C:30]([C:27]2[CH:26]=[CH:25][C:24]([CH:22]=[CH:5][C:3]([O:2][CH3:1])=[O:4])=[CH:29][CH:28]=2)=[C:31]([C:34]2[CH:39]=[CH:38][CH:37]=[CH:36][CH:35]=2)[CH2:32][CH3:33])=[CH:45][CH:44]=1
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참가 물질

6

반응물 3

HCID 80029Trimethyl phosphonoacetateHCID 2724254Sodium bis(trimethylsilyl)amideHCID 12085902HCID 12085902, 화합물

생성물 1

HCID 69858985HCID 69858985, 화합물수율 90.1%

시약·촉매·용매 2

HCID 8028Tetrahydrofuran용매3회
HCID 57417360
Sodium chloride; water
용매

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온도
-78 °C

실험 절차

To a solution of trimethyl phosphonoacetate (412 mg, 2.26 mmol) in THF (15 mL) at 0° C. was added 1M sodium bis(trimethylsilyl)amide in THF (2.26 mL, 2.26 mmol) dropwise. After stirring 15 min the mixture was cooled to −78° C. and a solution of aldehyde (4) (625 mg, 1.89 mmol) in THF (8 mL) was added dropwise. The solution was allowed to warm to rt. After stirring 4 h, brine was added and the mixture was extracted with EtOAc. The combined organic layers were washed with water, brine, and dried (MgSO4). The solvent was removed under reduced pressure and the residue was chromatographed (silica gel, 7.5 to 15% EtOAc/hexanes) to give the ester (5) as a white solid (658 mg, 90%): 1 H NMR (CDCl3) δ 7.52 (d, J=16.1 Hz, 1 H), 7.15 (m, 11 H), 6.86 (d, J=8.1 Hz, 2 H), 6.28 (d, J=16.1 Hz, 1 H), 3.76 (s, 3 H), 2.47 (q, J=7.7 Hz, 2 H), 0.93 (t, J=7.7 Hz, 3 H); APcI m/z: 428 (M+H+CH3CN+, 100%).

후처리

  1. temperatureto warm to rt
  2. stirringAfter stirring 4 h
  3. extractionthe mixture was extracted with EtOAc
  4. washThe combined organic layers were washed with water, brine
  5. dry with materialdried (MgSO4)
  6. customThe solvent was removed under reduced pressure
  7. customthe residue was chromatographed (silica gel, 7.5 to 15% EtOAc/hexanes)

출처 및 근거

ORD 기록
ord-9886edc9a2ef4d41a662626952c86ab6
출처 데이터셋
uspto-grants-2003_03
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US06528681B2

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