Mesitylene → Bis(eta-cyclopentadienyl) iron

HRID 1890132

반응식

HRID 1890132 반응식
[C:1]1([CH3:9])[CH:6]=[C:5]([CH3:7])C=C(C)C=1.C([C-:12]1[CH:16]=[CH:15][CH:14]=[CH:13]1)=C.[CH-]1C=CC=C1.[Fe+2:22].[C-]1(C=O)C=CC=C1.[CH-]1C=CC=C1.[Fe+2]>>[CH-:5]1[CH:6]=[CH:1][CH:9]=[CH:7]1.[CH-:12]1[CH:16]=[CH:15][CH:14]=[CH:13]1.[Fe+2:22]

참가 물질

4

반응물 3

HCID 7947MesityleneHCID 15184314Ferrocenecarboxyaldehyde2회HCID 15807218Cyclopenta-1,3-diene;5-ethenylcyclopenta-1,3-diene;iron(2+)2회

생성물 1

HCID 7611Bis(eta-cyclopentadienyl) iron

반응 조건

온도
150 °C

실험 절차

Approximately 10 mmol mesitylene solution of vinylferrocene (VFc) or ferrocenecarboxaldehyde (FcA) was put in a round bottom flask and bubbled with nitrogen or argon gas for at least 30 min. A piece of the H-terminated silicon substrate was then immersed in the solution and allowed to react with VFc or FcA for about 12 h under reflux at about 150° C. in an oil bath. During the reaction, the solution was also purged with nitrogen (or argon) to eliminate dissolved oxygen and to prevent the substrate from being oxidized. After the reaction, the substrate derivatized with VFc or FcA was rinsed with dichloromethane, acetonitrile and methanol, and dried under a stream of nitrogen gas. The derivatization of the H-terminated surface with ferrocene moieties as described in Example 2 is illustrated in FIG. 5.

후처리

  1. custombubbled with nitrogen or argon gas for at least 30 min
  2. customto react with VFc or FcA for about 12 h
  3. customDuring the reaction
  4. customthe solution was also purged with nitrogen (or argon)
  5. dissolutionto eliminate dissolved oxygen
  6. customAfter the reaction
  7. washwas rinsed with dichloromethane, acetonitrile and methanol
  8. customdried under a stream of nitrogen gas

출처 및 근거

ORD 기록
ord-d6ce1df1970a418291ecdd71c526c1f8
출처 데이터셋
uspto-grants-2013_08
특허 번호
US08506779B2

연결된 노트

불러오는 중…