Methanol → HCID 54335129, 화합물

HRID 1934496노트

반응식

HRID 1934496 반응식
O[CH2:2][C:3]([C:5]1[CH:10]=[CH:9][CH:8]=[CH:7][CH:6]=1)=[O:4].[F:11][C:12]1[CH:13]=[C:14]([CH:17]=[CH:18][C:19]=1[F:20])[CH:15]=O.C[O-:22].[Na+].CO>C(OC)(OC)OC>[F:11][C:12]1[CH:13]=[C:14]([CH:15]=[CH:2][C:3]([C:5]2[CH:6]=[CH:7][CH:8]=[CH:9][C:10]=2[OH:22])=[O:4])[CH:17]=[CH:18][C:19]=1[F:20]

참가 물질

6

반응물 4

HCID 887MethanolHCID 68490alpha-HydroxyacetophenoneHCID 5880883,4-DifluorobenzaldehydeHCID 10942334Sodium Methoxide

생성물 1

HCID 54335129HCID 54335129, 화합물

시약·촉매·용매 1

HCID 9005Trimethyl orthoformate용매

실험 절차

A mixture of 2-hydroxyacetophenone on Wang resin (2.0 g, 1.76 mmol) was swelled in trimethyl orthoformate (20 mL) for 10 min. 3,4-Difluorobenzaldehyde (6.0 mmol) was added and 25% NaOMe in MeOH (0.86 g, 4.0 mmol) was added to the mixture dropwise over 30 min. The mixture was then stirred for an additional 0.5 h. The resin was filtered and washed with alternating MeOH and CH2Cl2 (×5) and dried under high vacuum overnight to give 2.17 g of 3-(3,4-difluorophenyl)-1-(2-hydroxyphenyl)-2-propen-1-one on Wang resin.

후처리

  1. filtrationThe resin was filtered
  2. washwashed with alternating MeOH and CH2Cl2 (×5)
  3. customdried under high vacuum overnight

출처 및 근거

ORD 기록
ord-1f04fad7e51048bb9f00dac5369e5540
출처 데이터셋
uspto-grants-2002_05
특허 번호
US06384057B1

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