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Ethyl orthoformate → 6-tosyl-6H-pyrrolo[2,3-e][1,2,4]triazolo[4,3-a]pyrazine

HRID 1969690
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인쇄 미리보기

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HRID 1969690 반응식
C(O[CH2:9][CH3:10])(OCC)OCC.[NH:11]([C:13]1[N:14]=[C:15]2[CH:21]=[CH:20][N:19]([S:22]([C:25]3[CH:31]=[CH:30][C:28]([CH3:29])=[CH:27][CH:26]=3)(=[O:24])=[O:23])[C:16]2=[N:17]C=1)[NH2:12]>CN(C=O)C>[S:22]([N:19]1[C:16]2[N:17]=[CH:9][C:10]3[N:14]([CH:13]=[N:11][N:12]=3)[C:15]=2[CH:21]=[CH:20]1)([C:25]1[CH:26]=[CH:27][C:28]([CH3:29])=[CH:30][CH:31]=1)(=[O:24])=[O:23]
참가 물질반응 조건실험 절차후처리출처 및 근거반응 노트

참가 물질

4

반응물 2

HCID 31214Ethyl orthoformateHCID 580098102-Hydrazinyl-5-tosyl-5H-pyrrolo[2,3-b]pyrazine

생성물 1

HCID 585574426-tosyl-6H-pyrrolo[2,3-e][1,2,4]triazolo[4,3-a]pyrazine수율 73.1%

시약·촉매·용매 1

HCID 6228Dimethylformamide용매

반응 조건

온도
100 °C

실험 절차

Triethyl orthoformate (76.0 mL, 456 mmol) was added to a mixture of 2-hydrazinyl-5-tosyl-5H-pyrrolo[2,3-b]pyrazine (13.8 g, 45.4 mmol, Example #1, Step D) and DMF (45 mL) under nitrogen. A reflux condenser was attached and the mixture was warmed to about 100° C. After about 17 h, the solution was allowed to cool to ambient temperature. The volatiles were removed under reduced pressure. The residue was slurried in water (100 mL) and then filtered, rinsing with water. The aqueous phase was extracted with EtOAc (200 mL). The organics were dried over anhydrous Na2SO4, filtered, and concentrated. The material was combined with the precipitate and then purified by silica gel chromatography eluting with a gradient of 0-5% MeOH in DCM to give 6-tosyl-6H-pyrrolo[2,3-e][1,2,4]triazolo[4,3-a]pyrazine (10.4 g, 73%): LC/MS (Table 1, Method n) Rt=0.59 min; MS m/z 314 (M+H)+.

후처리

  1. customA reflux condenser was attached
  2. temperatureto cool to ambient temperature
  3. customThe volatiles were removed under reduced pressure
  4. filtrationfiltered
  5. washrinsing with water
  6. extractionThe aqueous phase was extracted with EtOAc (200 mL)
  7. dry with materialThe organics were dried over anhydrous Na2SO4
  8. filtrationfiltered
  9. concentrationconcentrated
  10. custompurified by silica gel chromatography
  11. washeluting with a gradient of 0-5% MeOH in DCM

출처 및 근거

ORD 기록
ord-12604cfebf0e4b1ab48655e4d38bedcc
출처 데이터셋
uspto-grants-2013_04
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08426411B2

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