홈MCP워크벤치Skills
홈워크벤치알림마이페이지
llms.txt · MCP 가이드개인정보처리방침 · 이용약관 · 지원v1.8.0
  1. 홈
  2. /반응

Acetic Acid → 1-Methyl4-(4-prop-2-ynyl-phenyl)-piperazine

HRID 1984235
노트
인쇄 미리보기

반응식

HRID 1984235 반응식
C(O)(=O)C.FC(F)(F)C(O)=O.[BH4-].[Na+].[CH3:14][N:15]1[CH2:20][CH2:19][N:18]([C:21]2[CH:26]=[CH:25][C:24]([CH:27](O)[C:28]#[CH:29])=[CH:23][CH:22]=2)[CH2:17][CH2:16]1>C(Cl)Cl>[CH3:14][N:15]1[CH2:20][CH2:19][N:18]([C:21]2[CH:26]=[CH:25][C:24]([CH2:27][C:28]#[CH:29])=[CH:23][CH:22]=2)[CH2:17][CH2:16]1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

6

반응물 4

HCID 176Acetic AcidHCID 6422Trifluoroacetic acidHCID 4311764Sodium borohydrideHCID 577141411-[4-(4-Methyl-piperazin-1-yl)-phenyl]-prop-2-yn-1-ol

생성물 1

HCID 577141261-Methyl4-(4-prop-2-ynyl-phenyl)-piperazine수율 86.8%

시약·촉매·용매 1

HCID 6344
Dichloromethane
용매

실험 절차

To a stirred mixture of glacial acetic acid (72 ml) and trifluoroacetic acid (8 ml), NaBH4 (79.1 mmol) is added slowly under nitrogen at −15° C. The solution of 1-[4-(4-methyl-piperazin-1-yl)-phenyl]-prop-2-yn-1-ol (1 1.3 mmol) in CH2Cl2 (80 ml) is added dropwise over 0.5 h and the mixture is stirred at room temperature for 1 h. The solvents are removed under reduced pressure and the residue is added to saturated sodium bicarbonate. The aqueous solution is extracted with CH2Cl2. The organic layer is washed with brine, dried over magnesium sulfate and evaporated down. The crude product is applied to silica gel column chromatography, which is eluted with following solvents: CH2Cl2 and 5% MeOH in CH2Cl2. The solvent of the latter effluent is removed by evaporation and dried in vacuo to afford the title compound. yield 86.8%, Rf=0.52 (CH2Cl2:MeOH=9:1).

후처리

  1. additionis added slowly under nitrogen at −15° C
  2. customThe solvents are removed under reduced pressure
  3. additionthe residue is added to saturated sodium bicarbonate
  4. extractionThe aqueous solution is extracted with CH2Cl2
  5. washThe organic layer is washed with brine
  6. dry with materialdried over magnesium sulfate
  7. customevaporated down
  8. washis eluted with following solvents
  9. customThe solvent of the latter effluent is removed by evaporation
  10. customdried in vacuo

출처 및 근거

ORD 기록
ord-c429dc06342b4dc68ba2e173deb62d38
출처 데이터셋
uspto-grants-2009_06
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07544688B2

반응 노트

불러오는 중…

이 페이지에서참가 물질실험 절차후처리출처 및 근거반응 노트