Triethylamine → HCID 178440879, 화합물

HRID 1988362노트

반응식

HRID 1988362 반응식
[C:1]([C:5]1[CH:6]=[C:7](C(C)C(O)=O)[CH:8]=[C:9]([C:12]([CH3:15])([CH3:14])[CH3:13])[C:10]=1[OH:11])([CH3:4])([CH3:3])[CH3:2].Cl.Cl.[NH2:23][CH2:24][C:25]1[CH:26]=[C:27]([NH:31][C:32]([C:34]2[S:35][CH:36]=[CH:37][CH:38]=2)=[NH:33])[CH:28]=[CH:29][CH:30]=1.[OH:39]N1C2C=CC=CC=2N=N1.Cl.CN(C)[CH2:52][CH2:53][CH2:54]N=C=NCC.CCN(CC)CC>C(Cl)Cl.O>[C:12]([C:9]1[CH:8]=[C:7]([CH2:54][CH2:53][C:52]([NH:23][CH2:24][C:25]2[CH:30]=[CH:29][CH:28]=[C:27]([NH:31][C:32](=[NH:33])[C:34]3[S:35][CH:36]=[CH:37][CH:38]=3)[CH:26]=2)=[O:39])[CH:6]=[C:5]([C:1]([CH3:4])([CH3:3])[CH3:2])[C:10]=1[OH:11])([CH3:15])([CH3:14])[CH3:13]

참가 물질

8

반응물 5

HCID 8471TriethylamineHCID 757711-HydroxybenzotriazoleHCID 27239391,3-Propanediamine, N'-(ethylcarbonimidoyl)-N,N-dimethyl-, monohydrochlorideHCID 21692686HCID 21692686, 화합물HCID 178478771HCID 178478771, 화합물

생성물 1

HCID 178440879HCID 178440879, 화합물수율 85%

시약·촉매·용매 2

HCID 962Water용매HCID 6344Dichloromethane용매

반응 조건

온도
20 °C

실험 절차

To a solution of 2.78 g (10 mmol) of 3,5-di-tert-butyl-4-hydroxyphenylpropionic acid, 3.04 g (10 mmol) of N-[3-(aminomethyl)phenyl]thiophene-2-carboximidamide 2HCl (J. Med. Chem. (1998), 41(15), 2858), 1.48 g (11 mmol) of 1-hydroxybenzotriazole in 100 ml of CH2Cl2, in a 250 ml flask, 4.21 g (22 mmol) of 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide hydrochloride and 6.1 ml (44 mmol) of Et3N were added. After overnight stirring at 20° C., the reaction mixture was diluted with 100 ml water, stirred and decanted. The organic layer was successively washed with NaHCO3 saturated solution, water, KHSO4, (1M), water and brine. After drying over Na2SO4 and filtration, the organic solution was concentrated under reduced pressure. The residue was flash chromatographed over silica gel, using heptane/EtOAc:1/1 as eluent, to yield a cream light solid (85%). Melting point: 163-164° C.

후처리

  1. stirringstirred
  2. customdecanted
  3. washThe organic layer was successively washed with NaHCO3 saturated solution, water, KHSO4, (1M), water and brine
  4. dry with materialAfter drying over Na2SO4 and filtration
  5. concentrationthe organic solution was concentrated under reduced pressure
  6. customchromatographed over silica gel

출처 및 근거

ORD 기록
ord-ddf76202f0374363987b8f3393f19969
출처 데이터셋
uspto-grants-2009_06
특허 번호
US07553976B2

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