Hydrochloric Acid → 3-(4-fluorophenyl)-6-(4'-(hexanoyloxy)biphen-4-yl)-3-phenyl-3H-naphtho[2,1-b]pyran

HRID 2090519노트

반응식

HRID 2090519 반응식
[C:1](Cl)(=[O:7])[CH2:2][CH2:3][CH2:4][CH2:5][CH3:6].[F:9][C:10]1[CH:15]=[CH:14][C:13]([C:16]2([C:43]3[CH:48]=[CH:47][CH:46]=[CH:45][CH:44]=3)[O:21][C:20]3[CH:22]=[C:23]([C:30]4[CH:35]=[CH:34][C:33]([C:36]5[CH:41]=[CH:40][C:39]([OH:42])=[CH:38][CH:37]=5)=[CH:32][CH:31]=4)[C:24]4[C:29]([C:19]=3[CH:18]=[CH:17]2)=[CH:28][CH:27]=[CH:26][CH:25]=4)=[CH:12][CH:11]=1.N1C=CC=CC=1.Cl>C(Cl)Cl>[F:9][C:10]1[CH:15]=[CH:14][C:13]([C:16]2([C:43]3[CH:48]=[CH:47][CH:46]=[CH:45][CH:44]=3)[O:21][C:20]3[CH:22]=[C:23]([C:30]4[CH:35]=[CH:34][C:33]([C:36]5[CH:41]=[CH:40][C:39]([O:42][C:1](=[O:7])[CH2:2][CH2:3][CH2:4][CH2:5][CH3:6])=[CH:38][CH:37]=5)=[CH:32][CH:31]=4)[C:24]4[C:29]([C:19]=3[CH:18]=[CH:17]2)=[CH:28][CH:27]=[CH:26][CH:25]=4)=[CH:12][CH:11]=1

참가 물질

6

실험 절차

Hexanoyl chloride (5.01 g, 37 mmol) was added dropwise to a solution of 3-(4-fluorophenyl)-6-(4′-hydroxybiphen-4-yl)-3-phenyl-3H-naphtho[2,1-b]pyran (19.37 g, 37 mmol) in DCM (100 mL) containing pyridine (20 mL) at 0° C. After ½ h additional hexanoyl chloride (5.01 g, 37 mmol) was added. Stirring was continued for a further ½ h more, the solution was poured into HCl (2 M, 400 mL), separated and extracted with DCM (2×100 mL), the combined organic phases were washed with water saturated sodium bicarbonate (200 mL), dried (MgSO4) and the solvent removed under reduced pressure. The residue was filtered through a short plug of silica using DCM (50% in hexanes) as eluent. The solvent was removed under reduced and the residue triturated alternately with hexanes and methanol twice. The residue was dried under vacuum to give the title compound (16.51 g, 72%) as a yellow foam, mp 64-65° C.

후처리

  1. customseparated
  2. extractionextracted with DCM (2×100 mL)
  3. washthe combined organic phases were washed with water saturated sodium bicarbonate (200 mL)
  4. dry with materialdried (MgSO4)
  5. customthe solvent removed under reduced pressure
  6. filtrationThe residue was filtered through a short plug of silica
  7. customThe solvent was removed
  8. customthe residue triturated alternately with hexanes and methanol twice
  9. customThe residue was dried under vacuum

출처 및 근거

ORD 기록
ord-eadfda23f1194b3a93e05f3a44c3dc95
출처 데이터셋
uspto-grants-2013_05
특허 번호
US08436184B2

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