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Chlorotrimethylsilane → HCID 118024047, 화합물

HRID 2171783
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HRID 2171783 반응식
BrC(Br)C.C[Si](Cl)(C)C.[C:10]([O:18][CH2:19]I)(=[O:17])[C:11]1[CH:16]=[CH:15][CH:14]=[CH:13][CH:12]=1.Cl[C:22]1[C:23]2[N:31]=[C:30]([CH:32]3[CH2:37][CH2:36][C:35]([CH3:39])([CH3:38])[CH2:34][CH2:33]3)[S:29][C:24]=2[N:25]=[C:26]([CH3:28])[N:27]=1>C1COCC1.[Zn].C1C=CC([P]([Pd]([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)[P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)=CC=1>[C:10]([O:18][CH2:19][C:22]1[C:23]2[N:31]=[C:30]([CH:32]3[CH2:37][CH2:36][C:35]([CH3:39])([CH3:38])[CH2:34][CH2:33]3)[S:29][C:24]=2[N:25]=[C:26]([CH3:28])[N:27]=1)(=[O:17])[C:11]1[CH:16]=[CH:15][CH:14]=[CH:13][CH:12]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

8

반응물 4

HCID 6397ChlorotrimethylsilaneHCID 112011,1-DibromoethaneHCID 10015543Iodomethyl BenzoateHCID 118023992HCID 118023992, 화합물

생성물 1

HCID 118024047HCID 118024047, 화합물수율 94.7%

시약·촉매·용매 3

HCID 23994Zinc촉매
HCID 178418397
HCID 178418397, 화합물
촉매
HCID 8028Tetrahydrofuran용매3회

실험 절차

Under an argon atmosphere, to a suspension of zinc powder (7.5 g) in THF (50 mL) were added dibromoethane (200 μL) and trimethylsilylchloride (200 μL), and then a solution of iodomethyl benzoate (15 g) in THF (50 mL) was added thereto, followed by stirring at room temperature for 1 hour. Then, a solution of 7-chloro-2-(4,4-dimethylcyclohexyl)-5-methyl[1,3]thiazolo[5,4-d]pyrimidine (10.9 g) in THF (50 mL) and Pd(PPh3)4 (4.25 g) were added thereto, followed by stirring at room temperature for 15 hours. The reaction mixture was filtered through Celite and then concentrated under reduced pressure. To the residue was added a 1 M aqueous NH4Cl solution, followed by extraction with EtOAc. To the organic layer were added MgSO4 and basic silica gel, followed by stirring, filtrating, and then concentrating under reduced pressure. The residue was purified by silica gel column (hexane/EtOAc) to obtain [2-(4,4-dimethylcyclohexyl)-5-methyl[1,3]thiazolo[5,4-d]pyrimidin-7-yl]methyl benzoate (13.8 g).

후처리

  1. stirringby stirring at room temperature for 15 hours
  2. filtrationThe reaction mixture was filtered through Celite
  3. concentrationconcentrated under reduced pressure
  4. additionTo the residue was added a 1 M aqueous NH4Cl solution
  5. extractionfollowed by extraction with EtOAc
  6. additionTo the organic layer were added MgSO4 and basic silica gel
  7. stirringby stirring
  8. filtrationfiltrating
  9. concentrationconcentrating under reduced pressure
  10. customThe residue was purified by silica gel column (hexane/EtOAc)

출처 및 근거

ORD 기록
ord-0186f5e0c40647d0993a9eeb7f712cb9
출처 데이터셋
uspto-grants-2015_06
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US09051339B2

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