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Hydrochloric Acid → (2R)-2-[3-cyclopropyl-4-(cyclopropylsulfonyl)phenyl]-3-[(1R)-3-oxocyclopentyl]propanoic acid

HRID 2192910
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HRID 2192910 반응식
[CH:1]1([C:4]2[CH:5]=[C:6]([C@@H:16]([CH2:20][C@H:21]3[CH2:25][CH2:24][C:23]4(OCC(C)(C)C[O:26]4)[CH2:22]3)[C:17]([OH:19])=[O:18])[CH:7]=[CH:8][C:9]=2[S:10]([CH:13]2[CH2:15][CH2:14]2)(=[O:12])=[O:11])[CH2:3][CH2:2]1.Cl>CC(C)=O>[CH:1]1([C:4]2[CH:5]=[C:6]([C@@H:16]([CH2:20][C@H:21]3[CH2:25][CH2:24][C:23](=[O:26])[CH2:22]3)[C:17]([OH:19])=[O:18])[CH:7]=[CH:8][C:9]=2[S:10]([CH:13]2[CH2:14][CH2:15]2)(=[O:12])=[O:11])[CH2:2][CH2:3]1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

4

반응물 2

HCID 313Hydrochloric AcidHCID 59570883(2R)-2-[3-cyclopropyl-4-(cyclopropylsulfonyl)phenyl]-3-[(2R)-8,8-dimethyl-6,10-dioxaspiro[4.5]dec-2-yl]propionic acid

생성물 1

HCID 59570882(2R)-2-[3-cyclopropyl-4-(cyclopropylsulfonyl)phenyl]-3-[(1R)-3-oxocyclopentyl]propanoic acid수율 100%

시약·촉매·용매 1

HCID 180Acetone용매

실험 절차

A mixture of (2R)-2-[3-cyclopropyl-4-(cyclopropylsulfonyl)phenyl]-3-[(2R)-8,8-dimethyl-6,10-dioxaspiro[4.5]dec-2-yl]propionic acid (22 g), 4 M hydrochloric acid (22 mL), and acetone (88 mL) was stirred under heating and reflux for 2 hours. The solvent was evaporated under reduced pressure, and then to the residue were added ethyl acetate/water (1/3, 300 mL) and sodium hydroxide (5.7 g) under ice-cooling. To the aqueous layer was added concentrated hydrochloric acid under ice-cooling to adjust the pH to 1, and chloroform was added thereto. The organic layer was washed with saturated brine and dried over anhydrous sodium sulfate, and the solvent was then evaporated under reduced pressure to obtain (2R)-2-[3-cyclopropyl-4-(cyclopropylsulfonyl)phenyl]-3-[(1R)-3-oxocyclopentyl]propionic acid (17.9 g) as a colorless amorphous substance.

후처리

  1. temperatureunder heating
  2. temperaturereflux for 2 hours
  3. customThe solvent was evaporated under reduced pressure
  4. additionto the residue were added ethyl acetate/water (1/3, 300 mL) and sodium hydroxide (5.7 g) under ice-
  5. temperaturecooling
  6. additionTo the aqueous layer was added concentrated hydrochloric acid under ice-
  7. temperaturecooling
  8. additionwas added
  9. washThe organic layer was washed with saturated brine
  10. dry with materialdried over anhydrous sodium sulfate
  11. customthe solvent was then evaporated under reduced pressure

출처 및 근거

ORD 기록
ord-967753dac5dd464e87dceec43f930c7a
출처 데이터셋
uspto-grants-2012_12
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08329707B2

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