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Hydrochloric Acid → HCID 69550750, 화합물

HRID 2214810
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HRID 2214810 반응식
I[Si](C)(C)C.C(OC([NH:16][C:17]1([CH2:29][N:30]2[CH2:35][CH2:34][N:33]([S:36]([C:39]3[CH:48]=[CH:47][C:46]4[C:41](=[CH:42][CH:43]=[C:44]([Cl:49])[CH:45]=4)[CH:40]=3)(=[O:38])=[O:37])[CH2:32][C:31]2=[O:50])[CH2:22][CH2:21][N:20]([C:23]2[CH:28]=[CH:27][N:26]=[CH:25][CH:24]=2)[CH2:19][CH2:18]1)=O)C1C=CC=CC=1.CO.[ClH:53]>ClCCl.C(OCC)(=O)C>[ClH:49].[ClH:53].[NH2:16][C:17]1([CH2:29][N:30]2[CH2:35][CH2:34][N:33]([S:36]([C:39]3[CH:48]=[CH:47][C:46]4[C:41](=[CH:42][CH:43]=[C:44]([Cl:49])[CH:45]=4)[CH:40]=3)(=[O:37])=[O:38])[CH2:32][C:31]2=[O:50])[CH2:22][CH2:21][N:20]([C:23]2[CH:24]=[CH:25][N:26]=[CH:27][CH:28]=2)[CH2:19][CH2:18]1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

7

반응물 4

HCID 313Hydrochloric AcidHCID 887Methanol2회HCID 85247Trimethylsilyl iodideHCID 69550015HCID 69550015, 화합물

생성물 1

HCID 69550750HCID 69550750, 화합물

시약·촉매·용매 2

HCID 6344Dichloromethane용매
HCID 8857
Ethyl Acetate
용매

실험 절차

Iodotrimethylsilane (2.51 ml) was added to a solution of 1-[4-benzyloxycarbonylamino-1-(4-pyridyl)-4-piperidylmethyl]-4-(6-chloronaphthalene-2-sulfonyl)-2-piperazinone (4.58 g) in dichloromethane (50 ml), and the mixture was stirred at room temperature for 4 hours. Methanol (10 ml) and 4N hydrochloric acid solution in ethyl acetate (8 ml) were added thereto. Methanol was added to obtain a solution, followed by concentration under reduced pressure. Dilute hydrochloric acid was added to the residue, and the mixture was washed with ether. The aqueous layer was made basic with 6N sodium hydroxide, followed by extraction with ethyl acetate. The organic layer was washed successively with an aqueous sodium bicarbonate solution and an aqueous saturated sodium chloride solution, dried, and concentrated. Dilute hydrochloric solution was added to the residue, which was purified by CHP20 column chromatography (water:acetonitrile:1N hydrochloric acid=100:0:1→80:20:1) to obtain the colorless amorphous title compound (3.66 g).

후처리

  1. customto obtain a solution
  2. concentrationfollowed by concentration under reduced pressure
  3. additionDilute hydrochloric acid was added to the residue
  4. washthe mixture was washed with ether
  5. extractionfollowed by extraction with ethyl acetate
  6. washThe organic layer was washed successively with an aqueous sodium bicarbonate solution
  7. dry with materialan aqueous saturated sodium chloride solution, dried
  8. concentrationconcentrated
  9. additionDilute hydrochloric solution
  10. additionwas added to the residue, which
  11. customwas purified by CHP20 column chromatography (water:acetonitrile:1N hydrochloric acid=100:0:1→80:20:1)

출처 및 근거

ORD 기록
ord-b4d79b17acc44b0a81147ae01c2355ae
출처 데이터셋
uspto-grants-2006_09
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07109200B2

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