Hydrochloric Acid → 4-(5-amino-3-tert-butyl-pyrazol-1-yl)-2-methyl-N-(2-morpholin-4-yl-ethyl)benzenesulfonamide

HRID 221874노트

반응식

HRID 221874 반응식
C(=[N:14][NH:15][C:16]1[CH:21]=[CH:20][C:19]([S:22]([NH:25][CH2:26][CH2:27][N:28]2[CH2:33][CH2:32][O:31][CH2:30][CH2:29]2)(=[O:24])=[O:23])=[C:18]([CH3:34])[CH:17]=1)(C1C=CC=CC=1)C1C=CC=CC=1.[CH3:35][C:36]([CH3:43])([CH3:42])[C:37](=O)[CH2:38][C:39]#[N:40].Cl>C(O)C>[NH2:40][C:39]1[N:15]([C:16]2[CH:21]=[CH:20][C:19]([S:22]([NH:25][CH2:26][CH2:27][N:28]3[CH2:33][CH2:32][O:31][CH2:30][CH2:29]3)(=[O:24])=[O:23])=[C:18]([CH3:34])[CH:17]=2)[N:14]=[C:37]([C:36]([CH3:43])([CH3:42])[CH3:35])[CH:38]=1

참가 물질

5

실험 절차

To a solution of 4-(N′-benzhydrylidene-hydrazino)-2-methyl-N-(2-morpholin-4-yl-ethyl)-benzene sulfonamide (1.00 g, 2.09 mmol) and 4,4-dimethyl-3-oxopentanenitrile (392 mg, 3.13 mmol, 1.5 eq) in anhydrous ethanol (10.5 mL, 0.2 M) was added p-toluenebenzene sulfonic acid (402 mg, 4.18 mmol, 2.0 eq), and the reaction mixture was stirred at reflux under nitrogen. After 18 h, concentrated HCl (2 mL) was added and the reaction mixture was stirred at reflux under nitrogen for an additional 4 h. The reaction mixture was cooled to room temperature and concentrated at reduced pressure. The residue was partitioned between EtOAc (500 mL) and aqueous saturated NaHCO3 solution (300 mL). The organic layer was washed with water and brine, dried over Na2SO4, and concentrated at reduced pressure. The residue was purified by MPLC (70% to 90% EtOAc/hexane) to give 799 mg (91%) of the desired product. 1H-NMR (DMSO-d6) δ 7.85 (d, J=8.4 Hz, 1H), 7.61 to 7.55 (m, 3H), 5.40 (s, 1H), 5.38 (broad s, 2H), 3.46 (t, J=4.5 Hz, 4H), 2.88 (q, J=6.0 Hz, 2H), 2.60 (s, 3H), 2.27 to 2.18 (m, 6H), 1.20 (s, 9H); MS LC-MS [M+H]+=422, RT=1.95 min.

후처리

  1. temperatureat reflux under nitrogen
  2. stirringthe reaction mixture was stirred
  3. temperatureat reflux under nitrogen for an additional 4 h
  4. concentrationconcentrated at reduced pressure
  5. customThe residue was partitioned between EtOAc (500 mL) and aqueous saturated NaHCO3 solution (300 mL)
  6. washThe organic layer was washed with water and brine
  7. dry with materialdried over Na2SO4
  8. concentrationconcentrated at reduced pressure
  9. customThe residue was purified by MPLC (70% to 90% EtOAc/hexane)

출처 및 근거

ORD 기록
ord-a9cd95dfc8ea46bfbeff1368da15bba3
출처 데이터셋
uspto-grants-2012_06
특허 번호
US08207166B2

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