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Hydrochloric Acid → HCID 22493561, 화합물

HRID 2269231
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HRID 2269231 반응식
C[Li].FC(F)(F)S(O[C:9]1[C:18]2[C:13](=[C:14]([CH:19]([CH3:21])[CH3:20])[CH:15]=[CH:16][CH:17]=2)[N:12]=[C:11]([C:22]([O:24][CH3:25])=[O:23])[CH:10]=1)(=O)=O.Cl.[C:29](OCC)(=O)C.CCCCCC>O1CCCC1.[Cl-].[Zn+2].[Cl-].C1C=CC([P]([Pd]([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)[P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)=CC=1>[CH:19]([C:14]1[CH:15]=[CH:16][CH:17]=[C:18]2[C:13]=1[N:12]=[C:11]([C:22]([O:24][CH3:25])=[O:23])[CH:10]=[C:9]2[CH3:29])([CH3:21])[CH3:20]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

8

반응물 4

HCID 313Hydrochloric AcidHCID 21226206Ethyl acetate hexaneHCID 22493592HCID 22493592, 화합물HCID 178418348HCID 178418348, 화합물

생성물 1

HCID 22493561HCID 22493561, 화합물

시약·촉매·용매 3

HCID 3007855Zincchloride촉매
HCID 178418397
HCID 178418397, 화합물
촉매
HCID 8028Tetrahydrofuran용매3회

실험 절차

In 30 ml of tetrahydrofuran were suspended 1.8 g of zinc chloride at room temperature unclear a nitrogen gas stream. A 1.4M tetrahydrofuran solution of methyl lithium (9.5 ml) was added dropwise to the resulting suspension and the resulting mixture was stirred for one hour. The reaction mixture was added dropwise to a solution of 1 g of methyl 4-trifluoromethanesulfonyloxy-8-isopropylquinoline-2-carboxylate and 153 mg of tetrakis(triphenylphosphine)palladium in 20 ml of tetrahydrofuran, followed by stirring at room temperature for 65 hours. Dilute hydrochloric acid was added to the reaction mixture and the resulting mixture was extracted with ethyl acetate. The organic layer was successively washed with water and saturated saline, dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The residue so obtained was subjected to chromatography on a silica gel column (developing solvent: 2% ethyl acetate/n-hexane), whereby 125 mg of the title compound were obtained in the form of a colorless solid.

후처리

  1. customat room temperature
  2. stirringby stirring at room temperature for 65 hours
  3. extractionthe resulting mixture was extracted with ethyl acetate
  4. washThe organic layer was successively washed with water and saturated saline
  5. dry with materialdried over anhydrous magnesium sulfate
  6. concentrationconcentrated under reduced pressure
  7. customThe residue so obtained

출처 및 근거

ORD 기록
ord-5c2fb1deff484146ba24e4b40f5153af
출처 데이터셋
uspto-grants-2001_12
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US06329402B1

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