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Pyridine → HCID 18387761, 화합물

HRID 2271015
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HRID 2271015 반응식
[S:1]1[CH:5]=[CH:4][CH:3]=[C:2]1[C:6]1[CH:11]=[CH:10][C:9]([OH:12])=[CH:8][CH:7]=1.[C:13](OC(=O)C)(=[O:15])[CH3:14].N1C=CC=CC=1>O1CCCC1>[C:13]([O:12][C:9]1[CH:10]=[CH:11][C:6]([C:2]2[S:1][CH:5]=[CH:4][CH:3]=2)=[CH:7][CH:8]=1)(=[O:15])[CH3:14]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

5

반응물 3

HCID 1049PyridineHCID 7918Acetic AnhydrideHCID 35641974-Thiophen-2-ylphenol

생성물 1

HCID 18387761HCID 18387761, 화합물수율 79.5%

시약·촉매·용매 1

HCID 8028Tetrahydrofuran용매

실험 절차

To a mixture of 4-(2-thienyl)phenol (1.00 g) and acetic anhydride (869 mg) in tetrahydrofuran (10 ml) was added pyridine (494 mg) with ice-cooling. The mixture was stirred for 1 hour at said temperature and 1 hour at ambient temperature. After concentration, the mixture was partitioned between AcOEt and H2O. The separated organic layer was washed with 1% aqueous citric acid, 3% aqueous NaHCO3 solution and brine, dried over sodium sulfate and concentrated. The residue was triturated with hexane to give 985 mg of 2-(4-acetoxyphenyl)thiophene as a powder.

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후처리

  1. temperaturecooling
  2. customtemperature and 1 hour
  3. customat ambient temperature
  4. concentrationAfter concentration
  5. customthe mixture was partitioned between AcOEt and H2O
  6. washThe separated organic layer was washed with 1% aqueous citric acid, 3% aqueous NaHCO3 solution and brine
  7. dry with materialdried over sodium sulfate
  8. concentrationconcentrated
  9. customThe residue was triturated with hexane

출처 및 근거

ORD 기록
ord-bd1ad6567ac44e729bc3b7b0944527a2
출처 데이터셋
uspto-grants-2001_12
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US06333324B1

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