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1-Ethyl-3-(3'-dimethylaminopropyl)carbodiimide → HCID 10146981, 화합물

HRID 2307723
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HRID 2307723 반응식
[O:1]([C:8]1[CH:9]=[C:10]([CH:40]=[CH:41][CH:42]=1)[CH2:11][N:12]([C@@H:30]1[C:39]2[C:34](=[CH:35][CH:36]=[CH:37][CH:38]=2)[CH2:33][CH2:32][CH2:31]1)[C:13]([C:15]1[CH:20]=[C:19]([C:21]([OH:23])=[O:22])[C:18]([C:24](O)=[O:25])=[CH:17][C:16]=1[C:27]([OH:29])=[O:28])=[O:14])[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1.[CH3:43][O:44][C:45]1[CH:50]=[CH:49][C:48]([S:51]([NH2:54])(=[O:53])=[O:52])=[CH:47][CH:46]=1.CCN=C=NCCCN(C)C>CN(C1C=CN=CC=1)C.C1COCC1>[CH3:43][O:44][C:45]1[CH:46]=[CH:47][C:48]([S:51]([NH:54][C:24]([C:18]2[CH:17]=[C:16]([C:27]([OH:29])=[O:28])[C:15]([C:13]([N:12]([CH2:11][C:10]3[CH:40]=[CH:41][CH:42]=[C:8]([O:1][C:2]4[CH:3]=[CH:4][CH:5]=[CH:6][CH:7]=4)[CH:9]=3)[C@@H:30]3[C:39]4[C:34](=[CH:35][CH:36]=[CH:37][CH:38]=4)[CH2:33][CH2:32][CH2:31]3)=[O:14])=[CH:20][C:19]=2[C:21]([OH:23])=[O:22])=[O:25])(=[O:53])=[O:52])=[CH:49][CH:50]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

6

반응물 3

HCID 159081-Ethyl-3-(3'-dimethylaminopropyl)carbodiimideHCID 707894-MethoxybenzenesulfonamideHCID 9829395A-317491

생성물 1

HCID 10146981HCID 10146981, 화합물

시약·촉매·용매 2

HCID 142844-(Dimethylamino)pyridine촉매HCID 8028
Tetrahydrofuran
용매

실험 절차

The product from Example 36B (114 mg, 0.2 mmol), 4-methoxybenzenesulfonamide (37 mg, 0.2 mmol), DMAP (25 mg, 0.2 mmol), and EDCI (78 mg, 0.4 mmol) were combined in THF (10 mL) at room temperature. After stirring overnight, the mixture was concentrated under reduced pressure and CH2Cl2 (20 mL) was added. The mixture was washed with water and the organic layer concentrated under reduced pressure. The residue was purified via HPLC to provide the title compounds. 1H (500 MHz; DMSO-d6) δ6.4-8.6 (m, br., 20H) 5.0 (m, 1H) 4.7 (m, 1H) 4.1 (m, 1H) 3.5 (br, 3H) 1.4-2.7 (m, 6H); MS (M+H)+735.

후처리

  1. concentrationthe mixture was concentrated under reduced pressure and CH2Cl2 (20 mL)
  2. additionwas added
  3. washThe mixture was washed with water
  4. concentrationthe organic layer concentrated under reduced pressure
  5. customThe residue was purified via HPLC

출처 및 근거

ORD 기록
ord-8fee3853e22243448830cb8e3dedd1b6
출처 데이터셋
uspto-grants-2004_12
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US06831193B2

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