Formic Acid → CRA-0450 free base

HRID 23545노트

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HRID 23545 반응식
[Cl:1][C:2]1[CH:7]=[C:6]([Cl:8])[CH:5]=[CH:4][C:3]=1[C:9]1[CH:10]=[CH:11][CH:12]=[C:13]2[C:18]=1[N:17]=[C:16]([CH3:19])[CH:15]=[C:14]2[N:20]1[CH2:25][CH:24]=[C:23]([C:26]#[N:27])[CH2:22][CH2:21]1.Cl.C(O)=[O:30]>>[Cl:1][C:2]1[CH:7]=[C:6]([Cl:8])[CH:5]=[CH:4][C:3]=1[C:9]1[CH:10]=[CH:11][CH:12]=[C:13]2[C:18]=1[N:17]=[C:16]([CH3:19])[CH:15]=[C:14]2[N:20]1[CH2:21][CH:22]=[C:23]([C:26](=[O:30])[NH2:27])[CH2:24][CH2:25]1

참가 물질

4

반응물 3

HCID 284Formic AcidHCID 313Hydrochloric AcidHCID 225744298-(2,4-Dichlorophenyl)-2-methyl-4-(4-cyano-1,2,3,6-tetrahydropyridin-1-yl)quinoline

생성물 1

HCID 9829517CRA-0450 free base

실험 절차

In 96% formic acid (5 mL) was dissolved 8-(2,4-dichlorophenyl)-2-methyl-4-(4-cyano-1,2,3,6-tetrahydropyridin-1-yl)quinoline (1.0 g), and hydrogen chloride gas was bubbled into the solution under ice-cooling to saturate the solution therewith. The reaction mixture was stirred at room temperature for 4 hours and then distilled under reduced pressure to remove the solvent. The residue was separated with chloroform and a saturated aqueous sodium hydrogen-carbonate solution, and the organic layer was dried over anhydrous sodium sulfate. The desiccating agent was filtered off and the filtrate was concentrated under reduced pressure. The residue was purified by a silica gel column chromatography (silica gel: Wako Gel (C200), eluent: chloroform-methanol=10:1) and then recrystallized from tetrahydrofuran to obtain the title compound (174 mg).

후처리

  1. customwas bubbled into the solution under ice-
  2. temperaturecooling
  3. concentrationto saturate the solution
  4. distillationdistilled under reduced pressure
  5. customto remove the solvent
  6. customThe residue was separated with chloroform
  7. dry with materiala saturated aqueous sodium hydrogen-carbonate solution, and the organic layer was dried over anhydrous sodium sulfate
  8. filtrationThe desiccating agent was filtered off
  9. concentrationthe filtrate was concentrated under reduced pressure
  10. customThe residue was purified by a silica gel column chromatography (silica gel: Wako Gel (C200), eluent: chloroform-methanol=10:1)
  11. customrecrystallized from tetrahydrofuran

출처 및 근거

ORD 기록
ord-4b52819b840a411f931f039b6dd4c35d
출처 데이터셋
uspto-grants-2005_02
특허 번호
US06852732B2

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