Hydrochloric Acid → Chloromethyldimethyl-2-phenylethylsilane

HRID 260636노트

반응식

HRID 260636 반응식
[C:1]1([CH2:7][CH2:8][Mg]Br)[CH:6]=[CH:5][CH:4]=[CH:3][CH:2]=1.C1(CCBr)C=CC=CC=1.[Mg].Cl[Si:22]([CH2:25][Cl:26])([CH3:24])[CH3:23].Cl>O1CCCC1.O>[Cl:26][CH2:25][Si:22]([CH3:24])([CH3:23])[CH2:8][CH2:7][C:1]1[CH:6]=[CH:5][CH:4]=[CH:3][CH:2]=1

참가 물질

8

반응물 5

HCID 313Hydrochloric AcidHCID 7666Phenethyl bromideHCID 74393Silane, chloro(chloromethyl)dimethyl-HCID 5462224MagnesiumHCID 178419670HCID 178419670, 화합물

생성물 1

HCID 22399658Chloromethyldimethyl-2-phenylethylsilane수율 48.5%

시약·촉매·용매 2

HCID 962Water용매HCID 8028Tetrahydrofuran용매2회

실험 절차

To a solution of 2-phenylethylmagnesium bromide, prepared from 2-phenylethyl bromide (9.25 g, 50 mmol) and magnesium (1.34 g, 55 mmol) in tetrahydrofuran (50 ml), is added chlorochlormethyldimethylsilane (6.43 g, 45 mmol) in tetrahydrofuran (25 ml). The mixture is refluxed for 18 hours, cooled to 0° C. and hydrolyzed with 3N HCl (50 ml). The mixture is then poured in water (50 ml) and diethyl ether (50 ml), the organic layer is washed with water, brine, dried over MgSO4 and the solvents removed in vacuo. Fractional distillation affords the title compound (5.15 g, 48.5% yield).

후처리

  1. temperatureThe mixture is refluxed for 18 hours
  2. washdiethyl ether (50 ml), the organic layer is washed with water, brine
  3. dry with materialdried over MgSO4
  4. customthe solvents removed in vacuo
  5. distillationFractional distillation

출처 및 근거

ORD 기록
ord-6a12f37e08094ca1adf45eec0b590c59
출처 데이터셋
uspto-grants-1996_06
특허 번호
US05529988

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