Chlorotrimethylsilane → 2-Benzyl-2-trimethylsilyl-1,3-dithiane

HRID 260644

반응식

[CH2:1]([CH:8]1[S:13][CH2:12][CH2:11][CH2:10][S:9]1)[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1.[CH3:14][Si:15](Cl)([CH3:17])[CH3:16]>>[CH2:1]([C:8]1([Si:15]([CH3:17])([CH3:16])[CH3:14])[S:9][CH2:10][CH2:11][CH2:12][S:13]1)[C:2]1[CH:3]=[CH:4][CH:5]=[CH:6][CH:7]=1

참가 물질

반응물 2

HCID 6397Chlorotrimethylsilane

HCID 3002912-Benzyl-1,3-dithiane

생성물 1

HCID 104690082-Benzyl-2-trimethylsilyl-1,3-dithiane수율 75%

실험 절차

The title compound of this step was prepared in 75% yield, by the procedure described in JACS 89, (1967), 4347 by E. J. Corey, et al., using 2-benzyl-1,3-dithiane and trimethylsilyl chloride. The product was recrystallized from diethyl ether/pentane.

후처리

customThe product was recrystallized from diethyl ether/pentane

출처 및 근거

ORD 기록: ord-157274fec4e5454391c7c93903080036
출처 데이터셋: uspto-grants-1996_06
DOI: 10.6084/m9.figshare.5104873.v1
특허 번호: US05529988

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