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Sulfuric Acid → Dimethyl (6-methyl-2-oxoheptyl)phosphonate

HRID 28786
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반응식

HRID 28786 반응식
[CH3:1][P:2](=[O:7])([O:5][CH3:6])[O:3][CH3:4].[Li]CCCC.[CH3:13][CH:14]([CH3:22])[CH2:15][CH2:16][CH2:17][C:18](OC)=[O:19].CC(C)CCCC(O)=O.S(=O)(=O)(O)O>C1COCC1.CO>[CH3:13][CH:14]([CH3:22])[CH2:15][CH2:16][CH2:17][C:18](=[O:19])[CH2:1][P:2](=[O:7])([O:5][CH3:6])[O:3][CH3:4]
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참가 물질

8

반응물 5

HCID 1118Sulfuric AcidHCID 123445-Methylhexanoic acidHCID 12958Dimethyl methylphosphonateHCID 519894Methyl 5-methylhexanoateHCID 178418339Butyllithium

생성물 1

HCID 15223968Dimethyl (6-methyl-2-oxoheptyl)phosphonate수율 76.2%

시약·촉매·용매 2

HCID 887Methanol용매
HCID 8028Tetrahydrofuran용매

실험 절차

To a solution of dimethyl methylphosphonate (2.17 ml, 20 mmol) in anhydrous THF (20 mL), cooled at −78° C. was added n-BuLi (1.6 M in hexane, 13.7 mL, 22 mmol). The mixture was stirred for 30 minutes at this temperature under nitrogen. Methyl 5-methylhexanoate (1.44 g, 10 mmol), prepared from 5-methylhexanoic acid (from Avocado) and methanol at the presence of the catalytic amount of the concentrated sulfuric acid (the procedure described in Intermediate 17.1), was added dropwise for 10 minutes. The mixture was stirred for 2 hours at −78° C., gradually was warm to room temperature. The mixture was quenched with addition of 1N HCl to pH 4-5. The organic layer was separated, washed with brine and dried over MgSO4. The residue was purified through flash chromatography on silica gel (EtOAc:Hexanes=1:1) to give the product (1.80 g) with colorless oil in 76% yield. 1HNMR (CD3OD, ppm) δ 0.866 (d, J=6.5 Hz, 6H), 1.16 (m, 2H), 1.56 (m, 3H), 2.58 (t, J=7.3 Hz, 2H), 3.10 (d, J=22.7 Hz, 2H), 3.70 (s, 3H), 3.79 (s, 3H)

후처리

  1. additionwas added dropwise for 10 minutes
  2. stirringThe mixture was stirred for 2 hours at −78° C.
  3. customThe mixture was quenched with addition of 1N HCl to pH 4-5
  4. customThe organic layer was separated
  5. washwashed with brine
  6. dry with materialdried over MgSO4
  7. customThe residue was purified through flash chromatography on silica gel (EtOAc:Hexanes=1:1)

출처 및 근거

ORD 기록
ord-002ca54a27b442f1985da6a42793eac5
출처 데이터셋
uspto-grants-2008_09
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07419999B2

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