Sodium Hydroxide → {2-[(4-Methoxyphenyl)sulfanyl]phenyl}methanol

HRID 380347

반응식

HRID 380347 반응식
[CH3:1][O:2][C:3]1[CH:8]=[CH:7][C:6]([S:9][C:10]2[CH:18]=[CH:17][CH:16]=[CH:15][C:11]=2[C:12](O)=[O:13])=[CH:5][CH:4]=1.[OH-].[Na+]>C1(C)C=CC=CC=1>[CH3:1][O:2][C:3]1[CH:4]=[CH:5][C:6]([S:9][C:10]2[CH:18]=[CH:17][CH:16]=[CH:15][C:11]=2[CH2:12][OH:13])=[CH:7][CH:8]=1

참가 물질

4

반응물 2

HCID 14798Sodium HydroxideHCID 28248782-(4-Methoxyphenylthio)benzoic acid

생성물 1

HCID 818003{2-[(4-Methoxyphenyl)sulfanyl]phenyl}methanol

시약·촉매·용매 1

HCID 1140Toluene용매2회

반응 조건

온도
20 °C

실험 절차

A mixture of a 60% solution of Na bis-(2-methoxyethoxy)aluminum hydride (85.0 g) and toluene (120 ml) was added dropwise during 1 h to a stirred suspension of 2-(4-methoxyphenylsulfanyl)benzoic acid (33.4 g, 0.128 mol) in toluene (270 ml) under nitrogen atmosphere. Temperature of the reaction mixture was allowed to reach 50° C., then the mixture was cooled down to 20° C. and the mixture was stirred for 5 h. Then a 10% solution of sodium hydroxide (50 ml) was added, the toluene layer was separated and successively washed with a 5% solution of sulfuric acid (50 ml) and water (2×50 ml). An oily residue after evaporation of toluene (31.2 g, 99.2%) was used for the next step without further purification.

후처리

  1. customto reach 50° C.
  2. customthe toluene layer was separated
  3. washsuccessively washed with a 5% solution of sulfuric acid (50 ml) and water (2×50 ml)
  4. customAn oily residue after evaporation of toluene (31.2 g, 99.2%)
  5. customwas used for the next step without further purification

출처 및 근거

ORD 기록
ord-915230636e8c4d2cb5c0e21424aa82f7
출처 데이터셋
uspto-grants-2001_10
특허 번호
US06303612B1

연결된 노트

불러오는 중…