Hydrochloric Acid → 5-(Benzyloxy)cyclobutabenzen-1(2H)-one

HRID 404320노트

반응식

HRID 404320 반응식
[CH2:1]([O:8][C:9]1[CH:10]=[CH:11][C:12]2[CH2:16][C:15](OC)([O:17]C)[C:13]=2[CH:14]=1)[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1.Cl>C1COCC1.O.CCOC(C)=O>[CH2:1]([O:8][C:9]1[CH:10]=[CH:11][C:12]2[CH2:16][C:15](=[O:17])[C:13]=2[CH:14]=1)[C:2]1[CH:3]=[CH:4][CH:5]=[CH:6][CH:7]=1

참가 물질

6

반응물 2

HCID 313Hydrochloric AcidHCID 583801585-(Benzyloxy)-1,1-dimethoxy-1,2-dihydrocyclobutabenzene

생성물 1

HCID 583803075-(Benzyloxy)cyclobutabenzen-1(2H)-one

시약·촉매·용매 3

HCID 962Water용매HCID 8028Tetrahydrofuran용매HCID 8857Ethyl Acetate용매

실험 절차

H7.1 (270 mg, 1.00 mmol) was dissolved in 6 mL 5:1 THF and water. To this solution was added 0.5 mL 1N HCl, and the resulting mixture was stirred for 1 hour. The resulting mixture was then diluted with 20 mL EtOAc and washed with saturated NaHCO3 and brine. The organic layer was dried over MgSO4, filtered, and concentrated in the presence of silica gel. The residue was then purified by column chromatography with 10% EtOAc/hexane to afford H7.2 (204 mg, yield, 91.1%). MS ESI (pos.) m/e: 225.1 (M+H)+.

후처리

  1. washwashed with saturated NaHCO3 and brine
  2. dry with materialThe organic layer was dried over MgSO4
  3. filtrationfiltered
  4. concentrationconcentrated in the presence of silica gel
  5. customThe residue was then purified by column chromatography with 10% EtOAc/hexane
  6. customto afford
  7. customH7.2 (204 mg, yield, 91.1%)

출처 및 근거

ORD 기록
ord-edccee1f97fc49749382e3781619ed4d
출처 데이터셋
uspto-grants-2014_06
특허 번호
US08748462B2

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