홈MCP워크벤치Skills
홈워크벤치알림마이페이지
llms.txt · MCP 가이드개인정보처리방침 · 이용약관 · 지원v1.8.0
  1. 홈
  2. /반응

Water → HCID 53867136, 화합물

HRID 483896
노트
인쇄 미리보기

반응식

HRID 483896 반응식
[Cl:1][O-:2].[Na+].[OH2:4].C(OC[O:13][P:14]([CH2:25][P:26](=[O:45])([O:36]COC(=O)C(C)(C)C)[O:27]COC(=O)C(C)(C)C)(=O)OCOC(=O)C(C)(C)C)(=O)C(C)(C)C.C(Cl)(Cl)[Cl:47]>>[Cl:1][O:2][P:14]([CH2:25][P:26](=[O:45])([OH:36])[OH:27])(=[O:13])[O:4][Cl:47]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

5

반응물 4

HCID 962WaterHCID 6212Chloroform2회HCID 11767374Tetrakis[(pivaloyloxy)methyl] methylenediphosphonateHCID 23665760Sodium Hypochlorite

생성물 1

HCID 53867136HCID 53867136, 화합물

실험 절차

A 5.25% solution of sodium hypochlorite in water (4.4 ml, 3.4 mmol) was added dropwise over 10 minutes to a stirred solution of methylenebisphosphonic acid tetra(pivaloyloxymethyl) ester (1.0 g, 1.58 mmol) in CHCl3 (5 ml). After addition was complete, the reaction mixture was stirred at room temperature for 1 hour and then allowed to stand overnight. Additional CHCl3 was added and the aqueous layer separated. After drying (Na2SO4) and filtering the solvent was removed under reduced pressure to give the tetra(pivaloyloxymethyl)ester of dichloro-methylene-bisphosphonic acid.

이 페이지에서참가 물질실험 절차후처리출처 및 근거반응 노트

후처리

  1. additionAfter addition
  2. waitto stand overnight
  3. customthe aqueous layer separated
  4. dry with materialAfter drying (Na2SO4)
  5. filtrationfiltering the solvent
  6. customwas removed under reduced pressure

출처 및 근거

ORD 기록
ord-46afe54933f64cbea83af2af2d0dc648
출처 데이터셋
uspto-grants-1993_07
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US05227506

반응 노트

불러오는 중…