Methacrylic Acid → Methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid

HRID 485647

반응식

HRID 485647 반응식
[C:1]([O:6][CH3:7])(=[O:5])[C:2]([CH3:4])=[CH2:3].[C:8]([OH:13])(=[O:12])[C:9]([CH3:11])=[CH2:10].C(OOC(=O)C1C=CC=CC=1)(=O)C1C=CC=CC=1>O1CCOCC1>[C:1]([O:6][CH3:7])(=[O:5])[C:2]([CH3:4])=[CH2:3].[C:8]([OH:13])(=[O:12])[C:9]([CH3:11])=[CH2:10]

참가 물질

5

반응물 3

HCID 4093Methacrylic AcidHCID 6658Methyl MethacrylateHCID 7187Benzoyl Peroxide

생성물 1

HCID 65310Methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid

시약·촉매·용매 1

HCID 312751,4-Dioxane용매

반응 조건

온도
80 °C

실험 절차

9.0 g of methyl methacrylate, 0.86 g of methacrylic acid (charging ratio by mole=9/1), and 50 mg of benzoyl peroxide were dissolved in 50 g of dioxane, followed by heating the solution at 80° C. for 4 hours with agitation while purging with nitrogen and subsequently charging into a large amount of water. The resulting polymer was dissolved in a small amount of acetone and dropped into a large amount of a methanol/water mixture for re-precipitation, followed by drying in vacuo to obtain methyl methacrylate/methacrylic acid copolymer (molecular weight≈5,000).

후처리

  1. customwhile purging with nitrogen
  2. dissolutionThe resulting polymer was dissolved in a small amount of acetone
  3. additiondropped into a large amount of a methanol/water mixture for re-precipitation
  4. customby drying in vacuo

출처 및 근거

ORD 기록
ord-d6ac13ca28234d90bbc1490b4781d099
출처 데이터셋
uspto-grants-1985_08
특허 번호
US04537855

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