Sodium hydride → HCID 178504768, 화합물

HRID 536275노트

반응식

HRID 536275 반응식
[OH:1][C:2]1[C:11]2[N:10]=[C:9]([NH:12][C:13](=[O:20])[C:14]3[CH:19]=[CH:18][CH:17]=[N:16][CH:15]=3)[N:8]3[CH2:21][CH2:22][N:23]=[C:7]3[C:6]=2[CH:5]=[CH:4][C:3]=1[O:24][CH2:25][CH2:26][CH2:27][N:28]1[CH2:33][CH2:32][O:31][CH2:30][CH2:29]1.[H-].[Na+].Cl[CH2:37][C:38]1[CH:43]=[CH:42][C:41]([S:44]([CH3:47])(=[O:46])=[O:45])=[CH:40][CH:39]=1>CN(C=O)C>[CH3:47][S:44]([C:41]1[CH:42]=[CH:43][C:38]([CH2:37][O:1][C:2]2[C:11]3[N:10]=[C:9]([NH:12][C:13](=[O:20])[C:14]4[CH:19]=[CH:18][CH:17]=[N:16][CH:15]=4)[N:8]4[CH2:21][CH2:22][N:23]=[C:7]4[C:6]=3[CH:5]=[CH:4][C:3]=2[O:24][CH2:25][CH2:26][CH2:27][N:28]2[CH2:29][CH2:30][O:31][CH2:32][CH2:33]2)=[CH:39][CH:40]=1)(=[O:45])=[O:46]

참가 물질

5

반응물 3

HCID 24758Sodium hydrideHCID 1235301-(Chloromethyl)-4-methanesulfonylbenzeneHCID 178522494HCID 178522494, 화합물2회

생성물 1

HCID 178504768HCID 178504768, 화합물수율 70.3%

시약·촉매·용매 1

HCID 6228Dimethylformamide용매

실험 절차

N-[7-Hydroxy-8-(3-morpholin-4-ylpropoxy)-2,3-dihydroimidazo[1,2-c]quinazolin-5-yl]nicotinamide (Intermediate H, 0.09 g, 0.20 mmol) was suspended in DMF (2.0 mL) and NaH (0.02 g, 0.30 mmol, 60%) were added. After 20 min at rt 1-(chloromethyl)-4-(methylsulfonyl)benzene (0.06 g, 0.30 mmol) was added and the mixture was stirred at it for 16 h. The DMF was evaporated under reduced pressure and the residue triturated with a mixture of −10% MeOH in CH2Cl2 (4 mL). The mixture was vacuum filtered and the solids were washed well with CH2Cl2. The filtrate was concentrated under reduced pressure, and the residue purified via silica gel chromatography (0-6% MeOH/CH2Cl2). The fractions were combined, and the solvent was evaporated under reduced pressure. Drying under high vacuum gave the title compound (0.087 g, 70%): TLC (5% MeOH/CH2Cl2): Rf=0.47; HPLC MS RT=0.55 min, [M+Na]+=641; 1H NMR (DMSO-d6+2 drops TFA-d) δ: 2.21-2.35 (2H, m), 3.05-3.17 (2H, m), 3.22 (3H, s), 3.31 (2H, m), 3.42-3.52 (2H, m), 3.60-3.72 (2H, m), 3.94-4.04 (2H, m), 4.29 (2H, m), 4.39 (2H, t), 4.56 (2H, m), 5.37 (2H, s), 7.52 (1H, d), 7.72 (1H, dd), 7.85 (2H, d), 8.01 (2H, d), 8.10 (1H, d), 8.66 (1H, d), 8.89 (1H, dd), 9.43 (1H, s).

후처리

  1. customThe DMF was evaporated under reduced pressure
  2. customthe residue triturated with a mixture of −10% MeOH in CH2Cl2 (4 mL)
  3. filtrationfiltered
  4. washthe solids were washed well with CH2Cl2
  5. concentrationThe filtrate was concentrated under reduced pressure
  6. customthe residue purified via silica gel chromatography (0-6% MeOH/CH2Cl2)
  7. customthe solvent was evaporated under reduced pressure
  8. customDrying under high vacuum

출처 및 근거

ORD 기록
ord-7b43efd286dd47259b9b0477b5152355
출처 데이터셋
uspto-grants-2014_10
특허 번호
US08859572B2

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