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Tetrahydrofuran → HCID 66937363, 화합물

HRID 538128
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HRID 538128 반응식
[Cl:1][C:2]1[C:10]([O:11][CH3:12])=[CH:9][C:5]2[NH:6][CH:7]=[N:8][C:4]=2[CH:3]=1.C1COCC1.CCN(C(C)C)C(C)C.Cl[CH2:28][O:29][CH2:30][CH2:31][O:32][CH3:33]>CCOC(C)=O>[Cl:1][C:2]1[C:10]([O:11][CH3:12])=[CH:9][C:5]2[N:6]([CH2:28][O:29][CH2:30][CH2:31][O:32][CH3:33])[CH:7]=[N:8][C:4]=2[CH:3]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

6

반응물 4

HCID 8028TetrahydrofuranHCID 775901-(Chloromethoxy)-2-methoxyethaneHCID 81531DiisopropylethylamineHCID 178486901HCID 178486901, 화합물

생성물 1

HCID 66937363HCID 66937363, 화합물수율 65.4%

시약·촉매·용매 1

HCID 8857Ethyl Acetate용매
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실험 절차

To a mixture of 5-chloro-6-methoxy-1H-benzoimidazole (0.320 g, 1.75 mmol) and THF (10 mL), was added DIPEA (0.850 mL, 4.9 mmol) followed by 1-chloromethoxy-2-methoxy-ethane (0.310 g, 2.45 mmol) at 23° C. After stirring for 18 h, EtOAc (50 mL) was added. The organic layer was washed with brine (20 mL), dried, filtered, and concentrated under reduced pressure to afford (0.31 g) of crude material which was used without further purification in the next reaction.

후처리

  1. washThe organic layer was washed with brine (20 mL)
  2. customdried
  3. filtrationfiltered
  4. concentrationconcentrated under reduced pressure

출처 및 근거

ORD 기록
ord-abd3b593bf4e41349cb9bd16572f2e88
출처 데이터셋
uspto-grants-2014_10
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08865713B2

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