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Trimethylsilyldiazomethane → HCID 56930596, 화합물

HRID 547118
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HRID 547118 반응식
S(=O)(=O)(O)[O-].[K+].[C:7]([O:11][C:12]([NH:14][C@H:15]([C:19]1[CH:24]=[CH:23][C:22]([Cl:25])=[CH:21][CH:20]=1)[C:16]([O-:18])=[O:17])=[O:13])([CH3:10])([CH3:9])[CH3:8].[CH:26]1([NH2+]C2CCCCC2)CCCCC1.C[Si](C=[N+]=[N-])(C)C>CCOCC>[CH3:26][O:17][C:16](=[O:18])[C@H:15]([NH:14][C:12]([O:11][C:7]([CH3:10])([CH3:8])[CH3:9])=[O:13])[C:19]1[CH:24]=[CH:23][C:22]([Cl:25])=[CH:21][CH:20]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

5

반응물 3

HCID 167693TrimethylsilyldiazomethaneHCID 516920Potassium bisulfateHCID 67065186HCID 67065186, 화합물

생성물 1

HCID 56930596HCID 56930596, 화합물수율 97.2%

시약·촉매·용매 1

HCID 3283Diethyl Ether용매2회

실험 절차

A 0.5 N potassium bisulfate aqueous solution (7.9 mL) was added to a suspension of dicyclohexylammonium (R)-t-butoxycarbonylamino-(4-chloro-phenyl)acetate (605.6 mg, 1.30 mmol) in ether (16 mL), and the mixture was stirred for 10 minutes. Then, the aqueous layer was extracted with ether. The organic layer was washed with water and then brine, dried over anhydrous magnesium sulfate and then concentrated under reduced pressure. The resulting residue was dissolved in benzene (3.6 mL) and methanol (1.8 mL). A solution of trimethylsilyldiazomethane in ether (2 M, 0.71 mL, 1.43 mmol) was added dropwise under cooling with ice, and then the mixture was stirred for 10 minutes. The reaction mixture was concentrated under reduced pressure. The residue was purified by silica gel chromatography (hexane/ethyl acetate=4/1) to give the title compound (378.9 mg, 97%).

후처리

  1. extractionThen, the aqueous layer was extracted with ether
  2. washThe organic layer was washed with water
  3. dry with materialbrine, dried over anhydrous magnesium sulfate
  4. concentrationconcentrated under reduced pressure
  5. dissolutionThe resulting residue was dissolved in benzene (3.6 mL)
  6. temperatureunder cooling with ice
  7. stirringthe mixture was stirred for 10 minutes
  8. concentrationThe reaction mixture was concentrated under reduced pressure
  9. customThe residue was purified by silica gel chromatography (hexane/ethyl acetate=4/1)

출처 및 근거

ORD 기록
ord-898e1e88e5d545a1a774a3f335850c3c
출처 데이터셋
uspto-grants-2011_05
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07935688B2

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