Trimethoxysilane → HCID 86701421, 화합물

HRID 571122노트

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HRID 571122 반응식
[CH2:1]([Si:3]([CH2:17][CH3:18])([CH2:15][CH3:16])[N:4]([CH2:8][C:9]1[CH:14]=[CH:13][CH:12]=[CH:11][CH:10]=1)[CH2:5][CH:6]=[CH2:7])[CH3:2].[CH3:19][O:20][SiH:21]([O:24][CH3:25])[O:22][CH3:23]>[Pt].C([Si](C)(C)O[Si](C=C)(C)C)=C.C1(C)C=CC=CC=1>[CH2:17]([Si:3]([CH2:15][CH3:16])([CH2:1][CH3:2])[N:4]([CH2:8][C:9]1[CH:14]=[CH:13][CH:12]=[CH:11][CH:10]=1)[CH2:5][CH2:6][CH2:7][Si:21]([O:24][CH3:25])([O:22][CH3:23])[O:20][CH3:19])[CH3:18]

참가 물질

5

반응물 2

HCID 17215TrimethoxysilaneHCID 86701422N-triethylsilyl-N-benzyl-N-allylamine

생성물 1

HCID 86701421HCID 86701421, 화합물

시약·촉매·용매 2

HCID 10959889Platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane촉매HCID 1140Toluene용매

반응 조건

온도
50 °C

실험 절차

A flask equipped with a stirrer, reflux condenser, dropping funnel and thermometer was charged with 26.2 g (0.1 mol) of N-triethylsilyl-N-benzyl-N-allylamine and 0.07 g of a toluene solution of platinum/1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (Pt concentration 3 wt %) and heated at 50° C. Once the internal temperature became steady, 12.2 g (0.1 mol) of trimethoxysilane was added dropwise over 1 hour. Stirring was continued at the temperature for a further 1 hour. The reaction solution was distilled, collecting 32.6 g of a fraction having a boiling point of 144-146° C./0.1 kPa.

후처리

  1. customA flask equipped with a stirrer
  2. temperaturereflux condenser
  3. distillationThe reaction solution was distilled
  4. customcollecting 32.6 g of a fraction

출처 및 근거

ORD 기록
ord-ca44911220d8434ab8f2b44a3a225925
출처 데이터셋
uspto-grants-2015_05
특허 번호
US09024051B2

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