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1,2-Dichloroethane → tert-Butyl {2-[(1-hydroxy-2-methylpropan-2-yl)amino]-2-oxo-1-[3-(trifluoromethyl)phenyl]ethyl}-carbamate

HRID 574149
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HRID 574149 반응식
C(Cl)CCl.[C:5]([O:9][C:10]([NH:12][CH:13]([C:17]1[CH:22]=[CH:21][CH:20]=[C:19]([C:23]([F:26])([F:25])[F:24])[CH:18]=1)[C:14](O)=[O:15])=[O:11])([CH3:8])([CH3:7])[CH3:6].C1C=CC2N(O)N=NC=2C=1.[NH2:37][C:38]([CH3:42])([CH3:41])[CH2:39][OH:40]>CN(C=O)C>[C:5]([O:9][C:10](=[O:11])[NH:12][CH:13]([C:17]1[CH:22]=[CH:21][CH:20]=[C:19]([C:23]([F:24])([F:26])[F:25])[CH:18]=1)[C:14]([NH:37][C:38]([CH3:42])([CH3:41])[CH2:39][OH:40])=[O:15])([CH3:6])([CH3:7])[CH3:8]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

6

반응물 4

HCID 111,2-DichloroethaneHCID 118072-Amino-2-methyl-1-propanolHCID 757711-HydroxybenzotriazoleHCID 223091762-{[(Tert-butoxy)carbonyl]amino}-2-[3-(trifluoromethyl)phenyl]acetic acid

생성물 1

HCID 66807299tert-Butyl {2-[(1-hydroxy-2-methylpropan-2-yl)amino]-2-oxo-1-[3-(trifluoromethyl)phenyl]ethyl}-carbamate

시약·촉매·용매 1

HCID 6228
Dimethylformamide
용매
2회

실험 절차

360 mg (1.88 mmol) of EDC were added to a mixture of 400 mg (1.25 mmol) of [(tert-butoxycarbonyl)amino][3-(trifluoromethyl)phenyl]acetic acid and 254 mg (1.88 mmol) of HOBt in 10 ml of DMF, and the mixture was stirred at RT for 20 min. The resulting solution was added dropwise to a solution of 168 mg (1.88 mmol) of 2-amino-2-methyl-1-propanol in 2 ml of DMF. The reaction mixture was stirred at RT for 20 min. For purification, 1 ml of 1N hydrochloric acid was added and the entire reaction mixture was separated by preparative HPLC [Method 6]. The appropriate fraction was concentrated on a rotary evaporator and the residue was dried under high vacuum. This gave 364 mg (74% of theory) of the title compound.

후처리

  1. stirringThe reaction mixture was stirred at RT for 20 min
  2. customFor purification, 1 ml of 1N hydrochloric acid
  3. additionwas added
  4. customthe entire reaction mixture
  5. customwas separated by preparative HPLC [Method 6]
  6. concentrationThe appropriate fraction was concentrated on a rotary evaporator
  7. customthe residue was dried under high vacuum

출처 및 근거

ORD 기록
ord-bb5dc7cceb034d738b5f7ca68756e82f
출처 데이터셋
uspto-grants-2015_05
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US09034855B2

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