Acrylic Acid → HCID 17244964, 화합물

HRID 576739

반응식

HRID 576739 반응식
[F:1][C:2]([F:17])([F:16])[C:3]1[CH:4]=[C:5]([NH:9]C2C=CC=CC=2)[CH:6]=[CH:7][CH:8]=1.[C:18]([OH:22])(=[O:21])[CH:19]=[CH2:20].[OH-].[Na+]>O>[F:1][C:2]([F:16])([F:17])[C:3]1[CH:4]=[C:5]([NH:9][CH2:20][CH2:19][C:18]([OH:22])=[O:21])[CH:6]=[CH:7][CH:8]=1

참가 물질

5

반응물 3

HCID 6581Acrylic AcidHCID 75483-(Trifluoromethyl)-N-phenylanilineHCID 14798Sodium Hydroxide

생성물 1

HCID 17244964HCID 17244964, 화합물

시약·촉매·용매 1

HCID 962Water용매

반응 조건

온도
100 °C

실험 절차

To an aqueous solution of 3-trifluoromethylphenyl aniline (5.0 g) in water (15.0 ml) was added acrylic acid (3.2 ml) and the resulting mixture was stirred at 100° C. for one hour. The reaction mixture was basified with 5N aqueous sodium hydroxide solution and extracted with ethyl acetate (100 ml×2). The resulting organic layer was washed with saturated saline (50 ml), dried over anhydrous sodium sulfate and then concentrated under reduced pressure. The residue was purified by silica gel column chromatography (eluent: chloroform/methanol) to afford 3-(3-trifluoromethylphenylamino)propionic acid (8.4 g).

후처리

  1. extractionextracted with ethyl acetate (100 ml×2)
  2. washThe resulting organic layer was washed with saturated saline (50 ml)
  3. dry with materialdried over anhydrous sodium sulfate
  4. concentrationconcentrated under reduced pressure
  5. customThe residue was purified by silica gel column chromatography (eluent: chloroform/methanol)

출처 및 근거

ORD 기록
ord-26b75629e775465c8819f182137e5e1b
출처 데이터셋
uspto-grants-2015_05
특허 번호
US09040516B2

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