Acetic Acid → HCID 86723912, 화합물

HRID 576807

반응식

HRID 576807 반응식
[CH3:1][N:2]1[C:7](=[O:8])[C:6]([C:9]2[C:13](SC)=[CH:12][N:11]([C:16]3[CH:17]=[CH:18][CH:19]=[C:20]([CH:23]=3)[C:21]#[N:22])[N:10]=2)=[C:5]([CH3:24])[N:4]([C:25]2[CH:30]=[CH:29][CH:28]=[C:27]([C:31]([F:34])([F:33])[F:32])[CH:26]=2)[C:3]1=[O:35].OO.[S:38]([O-:42])([O-])(=[O:40])=S.[Na+].[Na+].[C:45](O)(=O)C>C(OCC)(=O)C.[O-][W]([O-])(=O)=O.[Na+].[Na+]>[CH3:1][N:2]1[C:7](=[O:8])[C:6]([C:9]2[C:13]([S:38]([CH3:45])(=[O:42])=[O:40])=[CH:12][N:11]([C:16]3[CH:17]=[CH:18][CH:19]=[C:20]([CH:23]=3)[C:21]#[N:22])[N:10]=2)=[C:5]([CH3:24])[N:4]([C:25]2[CH:30]=[CH:29][CH:28]=[C:27]([C:31]([F:33])([F:34])[F:32])[CH:26]=2)[C:3]1=[O:35]

참가 물질

7

반응물 4

HCID 176Acetic AcidHCID 784Hydrogen PeroxideHCID 24477Sodium ThiosulfateHCID 867239105-(3,6-dimethyl-2,4-dioxo-1-(3-trifluoromethylphenyl)-1,2,3,4-tetrahydropyrimidin-5-yl-4-(methylthio)-1H-pyrazol-1-yl)benzonitrile

생성물 1

HCID 86723912HCID 86723912, 화합물

시약·촉매·용매 2

HCID 26052Sodium tungstate촉매HCID 8857Ethyl Acetate용매

실험 절차

To a solution of 4-(5-(3,6-dimethyl-2,4-dioxo-1-(3-trifluoromethylphenyl)-1,2,3,4-tetrahydropyrimidin-5-yl-4-(methylthio)-1H-pyrazol-1-yl)benzonitrile (prepared in Example 269) (57.4 mg) in acetic acid (1.0 ml) were added aqueous hydrogen peroxide solution (63.4 μl) and sodium tungstate (3.8 mg) and the resulting mixture was stirred at room temperature for four hours. To the reaction mixture was added 10% aqueous sodium thiosulfate solution (1 ml) and the resulting mixture was stirred at room temperature for one hour. The reaction mixture was diluted with ethyl acetate (50 ml) and then washed with saturated saline (20 ml) and the organic layer was dried over anhydrous sodium sulfate. The organic layer was concentrated under reduced pressure and the residue was purified by silica gel column chromatography (eluent: hexane/ethyl acetate) to afford 4-(5-(3,6-dimethyl-2,4-dioxo-1-(3-trifluoromethylphenyl)-1,2,3,4-tetrahydropyrimidin-5-yl-4-(methylsulfonyl)-1H-pyrazol-1-yl)benzonitrile (29.4 mg).

후처리

  1. stirringthe resulting mixture was stirred at room temperature for one hour
  2. washwashed with saturated saline (20 ml)
  3. dry with materialthe organic layer was dried over anhydrous sodium sulfate
  4. concentrationThe organic layer was concentrated under reduced pressure
  5. customthe residue was purified by silica gel column chromatography (eluent: hexane/ethyl acetate)

출처 및 근거

ORD 기록
ord-6856f6251a984124935e6281bfa9d44b
출처 데이터셋
uspto-grants-2015_05
특허 번호
US09040516B2

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