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Hydrochloric Acid → methyl 2-methoxy-5-(4H-triazol-4-yl)benzoate

HRID 582079
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인쇄 미리보기

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HRID 582079 반응식
CO[C:3]1[CH:12]=[CH:11][C:10]([NH2:13])=C[C:4]=1[C:5]([O:7][CH3:8])=O.CN(C)/C=[N:17]/[N:18]=C/N(C)C.[C:24]1(C)C=CC(S(O)(=O)=O)=CC=1.Cl.[C:36]([O:39][CH2:40]C)(=[O:38])[CH3:37].ClCCl>C1(C)C=CC=CC=1.CO.ClCCl>[CH3:8][O:7][C:5]1[CH:4]=[CH:3][C:12]([CH:11]2[CH:10]=[N:13][N:18]=[N:17]2)=[CH:24][C:37]=1[C:36]([O:39][CH3:40])=[O:38]
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참가 물질

8

반응물 5

HCID 313Hydrochloric AcidHCID 6101p-Toluenesulfonic acidHCID 89843Methyl 5-amino-o-anisateHCID 9613942N'-((Dimethylamino)methylene)-N,N-dimethylformohydrazonamideHCID 21226138Dichloromethane ethylacetate

생성물 1

HCID 18464913methyl 2-methoxy-5-(4H-triazol-4-yl)benzoate

시약·촉매·용매

2
HCID 1140Toluene용매HCID 21226129Dichloromethane methanol용매

실험 절차

According to the method of J. Chem. Soc. (C), 1664 (1967), combine methyl 2-methoxy-5-aminobenzoate (2.0 g, 11 mmol), N,N-dimethylformamide azine (1.56 g, 11 mmol), p-toluenesulfonic acid (190 mg) in toluene (25 mL). Fit the reaction vessel with a gas inlet such that the head space of the vessel is swept with argon and scrub the effluent through dilute aqueous hydrochloric acid solution. Heat to reflux. After 20 hours, concentrate the reaction mixture in vacuo to give a residue. Partition the residue between dichloromethane and a saturated aqueous sodium bicarbonate solution. Extract the aqueous layer twice with dichloromethane. Combine the organic layers, dry over MgSO4, filter, and evaporate in vacuo to give a residue. Chromatograph the residue on silica gel eluting sequentially with 70% ethyl acetate/dichloromethane and then 5% methanol/dichloromethane to give a residue. Recrystallize the residue form ethyl acetate/hexane to give methyl 2-methoxy-5-(4H-triazol-4-yl)benzoate: mp; 191-195.5° C.

후처리

  1. customFit the reaction vessel with a gas inlet such that the head space of the vessel is swept with argon
  2. temperatureHeat to reflux
  3. concentrationconcentrate the reaction mixture in vacuo
  4. customto give a residue
  5. customPartition the residue between dichloromethane
  6. extractionExtract the aqueous layer twice with dichloromethane
  7. dry with materialdry over MgSO4
  8. filtrationfilter
  9. customevaporate in vacuo
  10. customto give a residue
  11. customRecrystallize the residue form ethyl acetate/hexane

출처 및 근거

ORD 기록
ord-9a340d738e0145fc8cef3843c8f08941
출처 데이터셋
uspto-grants-1999_07
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US05922737

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